Structure of ultra-thin Ti film on the Al(001) surface

Kopczyk, M.; Priyantha, W.; Childs, N.; Key, Cas; Lerch, Michael L. F; Smith, Richard J.; Choi, Deuk-Soo

doi:10.1016/j.susc.2010.03.002

Cited by 7 publications

(4 citation statements)

References 11 publications

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“…This is consistent with the measurements using ion scattering spectroscopy 24,25 and low-energy electron diffraction (LEED). 25,26 Although subsurface Ti was found favorable in a previous calculation for a 0.5 ML coverage of Ti on Al(100), 21 the single layer geometry considered in Ref. 21 has a higher energy than the alloy configurations with a local TiAl 3 arrangement as studied in the present work.…”

Section: Calculational Detailssupporting

confidence: 90%

Catalytic effect of near-surface alloying on hydrogen interaction on the aluminum surface

et al. 2011

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A small amount of catalyst, such as Ti, was found to greatly improve the kinetics of hydrogen reactions in the prototypical hydrogen storage compound NaAlH4. We propose a near-surface alloying mechanism for the rehydrogenation cycle based on detailed analysis of available experimental data as well as first-principles calculations. The calculated results indicate that the catalyst remains at subsurface sites near the Al surface, reducing the dissociation energy barrier of H2. The binding between Ti and Al modifies the surface charge distribution, which facilitates hydrogen adsorption and enhances hydrogen mobility on the surface.

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Section: Calculational Detailssupporting

confidence: 90%

Catalytic effect of near-surface alloying on hydrogen interaction on the aluminum surface

et al. 2011

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“…As the Ti coverage increases, LEIS polar-angle scans indicate that the top three Al layers are populated by Ti atoms. 54 Other studies of epitaxial growth of Ti on Al(110) and on Al(001) using Auger electron spectroscopy (AES) and quantitative low energy electron diffraction (QLEED) again indicate that the Ti atoms reside in the second layer of the substrate. 56 Theoretical calculations have also shown that it is energetically more favorable for Ti to be located below the top surface layer.…”

Section: Discussionmentioning

confidence: 98%

“…This observation is also consistent with the fact that no island formation as has been observed in previous STM studies performed at 300 K. 53 Experimental Rutherford backscattering measurements have in fact shown that Ti deposited on Al(100) tends to diffuse into the Al lattice upon heating. 54,55 Structural studies performed using low-energy electron diffraction (LEED) and low-energy ion scattering (LEIS), after submonolayer Ti deposition on Al(001) surfaces at room temperature have shown 54 that for low Ti coverages on Al(100), it is energetically more favorable for Ti atoms to substitutionally replace subsurface Al atoms in every other site. As the Ti coverage increases, LEIS polar-angle scans indicate that the top three Al layers are populated by Ti atoms.…”

Section: Discussionmentioning

confidence: 99%

“…Experimental Rutherford backscattering measurements have in fact shown that Ti deposited on Al(100) tends to diffuse into the Al lattice upon heating. , Structural studies performed using low-energy electron diffraction (LEED) and low-energy ion scattering (LEIS), after submonolayer Ti deposition on Al(001) surfaces at room temperature have shown that for low Ti coverages on Al(100), it is energetically more favorable for Ti atoms to substitutionally replace subsurface Al atoms in every other site. As the Ti coverage increases, LEIS polar-angle scans indicate that the top three Al layers are populated by Ti atoms . Other studies of epitaxial growth of Ti on Al(110) and on Al(001) using Auger electron spectroscopy (AES) and quantitative low energy electron diffraction (QLEED) again indicate that the Ti atoms reside in the second layer of the substrate .…”

Section: Discussionmentioning

confidence: 99%

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Effect of Titanium Doping of Al(111) Surfaces on Alane Formation, Mobility, and Desorption

Chopra¹,

Chaudhuri²,

Veyan³

et al. 2011

J. Phys. Chem. C

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Development of Catalyst‐Enhanced Sodium Alanate as an Advanced Hydrogen‐Storage Material for Mobile Applications

et al. 2017

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As a prototypical high‐capacity complex hydride, sodium alanate (NaAlH4) has attracted significant attention because of its favorable thermodynamics and the potential low cost of its raw materials (NaH and Al). However, a high desorption temperature and slow kinetics preclude its practical use, particularly in mobile applications. The introduction of appropriate catalysts has been demonstrated to reduce the operating temperature and to improve the reversibility of hydrogen storage in NaAlH4 effectively. In this Review, we survey the development of various catalytic additives and their effects on the hydrogen‐storage behavior of NaAlH4. First, the basic physical and chemical characteristics of NaAlH4 and its catalyst‐doping methods are briefly summarized. Then, the catalytically enhanced hydrogen‐storage properties and the corresponding mechanistic understanding are highlighted. Finally, the remaining challenges and the directions of future research efforts are discussed.

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Structure of ultra-thin Ti film on the Al(001) surface

Cited by 7 publications

References 11 publications

Catalytic effect of near-surface alloying on hydrogen interaction on the aluminum surface

Catalytic effect of near-surface alloying on hydrogen interaction on the aluminum surface

Effect of Titanium Doping of Al(111) Surfaces on Alane Formation, Mobility, and Desorption

Development of Catalyst‐Enhanced Sodium Alanate as an Advanced Hydrogen‐Storage Material for Mobile Applications

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