2015
DOI: 10.1109/led.2015.2471103
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Stress-Dependent Performance Optimization of Reconfigurable Silicon Nanowire Transistors

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Cited by 17 publications
(8 citation statements)
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“…In this respect, the most common approach is utilizing metal-semiconductor heterostructures embedded in a SBFET. [15] In this configuration, RFETs have already been fabricated based on Si, [4,8,16] Ge, [17][18][19] and also on 2D layered systems, like WSe 2 [20,21] or MoTe 2 , [22,23] and recently with black phosphorous. [24] Latest generation RFETs facilitate a device layout with three independent top-gates to induce additional energy barriers in the channel, enabling an even more effective suppression of the undesired charge carrier type and therefore favoring n-or p-type operation, respectively.…”
mentioning
confidence: 99%
“…In this respect, the most common approach is utilizing metal-semiconductor heterostructures embedded in a SBFET. [15] In this configuration, RFETs have already been fabricated based on Si, [4,8,16] Ge, [17][18][19] and also on 2D layered systems, like WSe 2 [20,21] or MoTe 2 , [22,23] and recently with black phosphorous. [24] Latest generation RFETs facilitate a device layout with three independent top-gates to induce additional energy barriers in the channel, enabling an even more effective suppression of the undesired charge carrier type and therefore favoring n-or p-type operation, respectively.…”
mentioning
confidence: 99%
“…By introducing a plurality of gate electrodes to Schottky-barrier nanowire FETs, reconfigurable nanowire FETs can be constructed (Figure , first row), which have multiple operation states. ,, For reconfigurable FETs, unipolar p - and n -type conduction can be merged into a single nanowire device, which is realized by programming an electric signal. Specifically, with a single semiconducting channel that can conduct both electrons and holes, undesired charge carriers can be filtered through the transistor by applying a local electric potential …”
Section: Fundamental Electronic Properties Of Single Nanowire Transis...mentioning
confidence: 99%
“…Later, fully symmetric electrical characteristics of RFETs and proof of complementary circuits built thereof were presented also by Heinzig et al (2013). Symmetry in the IV characteristics was reached by the application of stressors (figures 15 and 16(a)) to adjust the tunneling probability for both electrons and holes (Baldauf et al 2015) (figure 16(b)). In the second approach, (B) (see figure 14(b)) both Schottky junctions are steered simultaneously accumulating either injected holes (V PG < 0) or electrons (V PG > 0) in the channel and thus programming the device polarity.…”
Section: Reconfigurable and Polarity Control Nanowire Fetsmentioning
confidence: 99%
“…Silicon nanowires can be smoothened and trimmed in diameter by the formation of a sacrificial self-limited oxide (Liu et al 1994, Kedzierski et al 1999, Morita et al 2010. Figure 31 shows process simulation results of a dry oxidation at 875 °C (Baldauf et al 2015). This process is often combined with a high temperature hydrogen anneal that helps to reconstruct the nanowire surface smoothing out the line edge roughness.…”
Section: Top-down Nanowire Fabricationmentioning
confidence: 99%