Status of curvilinear data format working group

Choi, Jin; Ryu, Soo Jung; Lee, Sukho; Kim, Minah; Lee, Sang‐Hee; Buck, Peter; Durvasula, Bhardwaj; Gharat, Sayalee; Liubich, Vlad

doi:10.1117/12.2641557

Cited by 16 publications

(22 citation statements)

References 4 publications

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“…Additionally, we interpreted types of defects through clustering and attention map visualization. We anticipate that the transformer approach will be compatible with the Bezier curve based format [23], which is being proposed to reduce data in curvilinear masks with OPCed data. Future research could lay the foundation for automating GDS analysis and generative models through VGT-based studies.…”

Section: Discussionmentioning

confidence: 99%

Deep learning-based detection of mask rule check violations in curvilinear mask

Lee,

Park

et al. 2023

Photomask Technology 2023

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Section: Discussionmentioning

confidence: 99%

Deep learning-based detection of mask rule check violations in curvilinear mask

Lee,

Park

et al. 2023

Photomask Technology 2023

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“…In order to assuage the effects of curvilinear design on file size, the mask industry is currently working on a Bezier based curve format to be adopted as a SEMI standard [4] that is suitable to represent curvilinear shapes. An example of such formats is shown in Figure 5(b).…”

Section: Curvilinear Formatsmentioning

confidence: 99%

“…With the wafer process windows known to improve substantially with free-form curvilinear ILT [2], representing and computing with curvilinear shapes in MDP has gained in importance [12]. File sizes and computational complexity has become an increasing concern for the mask industry in the curvilinear era, prompting the industry to develop a SEMI standard [4].…”

Section: Introduction: Curvilinear Masks Representation Overviewmentioning

confidence: 99%

“…An industry standard for compactly representing curvilinear shapes is being developed for SEMI through an industry working group. In it, Bezier, and B-spline "Multigon" formats are proposed to augment the piecewise linear polygons that are supported today [4]. Whether these infinite-resolution curvilinear formats are used or piecewise linear polygons are used, there is a question of what constitutes a high enough vertex density to be of some pre-defined accuracy requirement.…”

mentioning

confidence: 99%

See 1 more Smart Citation

You don’t need 1nm contours for curvilinear shapes: pixel-based computing is the answer

Shendre¹,

Fujimura²,

Niewczas³

et al. 2022

Photomask Technology 2022

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Enabled by multi-beam mask writing [1], curvilinear free-form ILT [2], and GPU acceleration [3], curvilinear masks are quickly becoming the norm in leading edge masks, whether for 193i or for EUV, particularly for contact and via layers. An industry standard for compactly representing curvilinear shapes is being developed for SEMI through an industry working group. In it, Bezier, and B-spline "Multigon" formats are proposed to augment the piecewise linear polygons that are supported today [4]. Whether these infinite-resolution curvilinear formats are used or piecewise linear polygons are used, there is a question of what constitutes a high enough vertex density to be of some pre-defined accuracy requirement. With these infinite-resolution curvilinear formats, the vertex density would be lower than with piecewise linear polygons for a particular accuracy requirement. But it is still useful to know what density is theoretically sufficient. This paper explores the concept of rasterization and the mathematical dual between contours and pixel dose arrays given a particular known resolution limit. The paper further argues that curvilinear ILT, practically speaking, is all computed in the pixel domain. And all curvilinear masks, with the notable exception of MWCO masks for 193i [5], are written with multi-beam machines using pixel dose arrays. The paper further argues that all images taken of the resulting masks, whether for inspection, disposition, or for metrology are pictures taken as pixel dose arrays of some resolution with some image processing afterwards. Information theory is a branch of computer science that, among other things, gives insight on how much data is sufficient to represent any particular information content [6,7,8]. More generally, the field covers the idea of digitizing the analog world to some known limit of resolution. Rasterization is digitalization of images that converts from contours, be it piecewise linear polygons, or some infinite resolution curves, to pixel doses of some pixel size and dose range. Contouring is the converse, going from pixel doses to geometric space. By understanding information theory, how curvilinear mask shapes are computed, and how curvilinear mask shapes are generated on

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“…High-NA EUV masks 8,9,10 will require reduction in minimum feature size (MFS) and reduction of edge placement errors as illustrated in Figure 1. Additionally, it is expected that curvilinear mask patterning will also be deployed in the near future 11,12,13 . The next section will discuss the ability of the current generation of multibeam writers (MBMW101, MBMW201, MBMW261) to meet these requirements.…”

Section: Introductionmentioning

confidence: 99%

Multibeam mask requirements for advanced EUV patterning

Chandramouli

Liu

Alberti

et al. 2022

Photomask Technology 2022

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Multibeam mask writers (MBMW) from IMS Nanofabrication developed in the last decade are currently being used for leading edge mask patterning. The ability to utilize low sensitivity resists required to pattern complex mask patterns with good edge placement control made MBMW the tool of choice for leading edge extreme ultraviolet (EUV) mask patterning. The next generation of High-NA EUV masks will require smaller features, more complex figures and reduction of edge placement errors. These requirements may exceed the capability of the current MBMW tools. Recently IMS announced the next generation MBMW tools to address this challenge. This paper will explore the effectiveness of the proposed improvements on addressing High-NA EUV mask patterning challenges.

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Status of curvilinear data format working group

Cited by 16 publications

References 4 publications

Deep learning-based detection of mask rule check violations in curvilinear mask

Deep learning-based detection of mask rule check violations in curvilinear mask

You don’t need 1nm contours for curvilinear shapes: pixel-based computing is the answer

Multibeam mask requirements for advanced EUV patterning

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