Spectroscopic study on alternative plasmonic TiN-NRs film prepared by R-HiPIMS with GLAD technique

Optical Properties of Plasmonic Titanium Nitride Thin Films from Ultraviolet to Mid-Infrared Wavelengths Deposited by Pulsed-Dc Sputtering, Thermal and Plasma-Enhanced Atomic Layer Deposition

“…1. For the sample ''Sputtering 20'', peaks were revealed in the region 36.5 [18,20,25,26,28,31,[41][42][43][44][45], respectively. At a deposition temperature of 20 • , the dominant orientation is TiN [111], indicating that it retains the largest volume fraction.…”

“…There are various methods of TiN thin films deposition, including chemical vapor deposition [20], pulsed layer deposition [21,22], thermal [5,11] and plasma-enhanced [23,24] atomic layer deposition, molecular beam epitaxy [4], reactive radio frequency (RF) [25] and direct current (DC) [26] sputtering, pulsed-DC [27] and high-power impulse magnetron sputtering (HiPIMS) [28,29]. The optical properties of TiN films have been studied extensively.…”