Optical properties of plasmonic titanium nitride thin films from ultraviolet to mid-infrared wavelengths deposited by pulsed-DC sputtering, thermal and plasma-enhanced atomic layer deposition

Beliaev, Leonid Yu.; Shkondin, Evgeniy; Lavrinenko, Andrei V.; Takayama, Osamu

doi:10.1016/j.optmat.2023.114237

Cited by 7 publications

(6 citation statements)

References 73 publications

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“…38 In the films, however, the preferred orientation gets varied with temperature: films are highly oriented in [110] orientation only when deposited at a substrate temperature of 25 °C and [220] orientation becomes dominant as the substrate temperature rises up to 150 °C. Beliaev et al (2023) reported varying intensity of TiN x peaks with deposition methodology; intensity pattern observed in the present study matches with that of plasma-enhanced atomic layer deposition nitride films. 39 Change in the preferred orientation of the TiN x film could be attributed to the competition between the surface energy and strain energy.…”

Section: Resultssupporting

confidence: 84%

Stoichiometry-Led Electronic Structure Reconstruction Finetunes the Color Characteristics of Titanium Nitride Thin Films

Vishwakarma,

Kumar,

Kale

et al. 2024

J. Phys. Chem. C

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Atomic-vapor-deposited nitride thin films attract considerable interest as decorative coatings in various industrial applications. Recent research efforts in the process-structure relationship for such films have converged on the need to develop electronic characteristics-led design principles. Here, we varied substrate-temperature (180, 450 °C) for deposition of titanium nitride (TiN x ) thin films in a rocksalt structure with varying stoichiometry (x: 0.98−0.87). Reciprocity of the varying color characteristics of the deposited TiN x thin films was studied against their structural and electronic details by employing combined methods of experiments and simulations. The long-range and local structural order of the thin films were studied using grazing incidence X-ray diffraction analysis and Ti K-edge extended X-ray absorption fine structure spectroscopy (EXAFS), respectively. N K-edge X-ray absorption near-edge spectroscopy (XANES) and simulation of the spectrum using Green formalism (multiple scattering) delineated electronic reconstruction occurring during the atomic-level structural changes. In a key finding, no change in the density of states (DOS) was observed in the simulation carried out on a single NTi 6 octahedra extracted from the long-range structure of TiN x thin films. The axial compression of the octahedra under varying stoichiometry did not cause significant change electronically and therefore did not contribute to the varying color characteristics. Long-range structural characteristics led by substoichiometry of the TiN x thin films induced electron localization near the conduction band edge. Small change produced in the band gap thus tuned the color characteristics of the thin films.

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Section: Resultssupporting

confidence: 84%

Stoichiometry-Led Electronic Structure Reconstruction Finetunes the Color Characteristics of Titanium Nitride Thin Films

Vishwakarma,

Kumar,

Kale

et al. 2024

J. Phys. Chem. C

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“…As the first step, the complex permittivities of the 500 μm thick double-sided polished Si substrate were determined from the free-space reflection spectra. The retrieved parameters and the fitted spectrum are presented in the Supporting Information (Supporting Information, Table S2 and Figure S1), and a detailed description of the entire procedure can be found elsewhere. , …”

Section: Resultsmentioning

confidence: 99%

“…The retrieved parameters and the fitted spectrum are presented in the Supporting Information (Supporting Information, Table S2 and Figure S1), and a detailed description of the entire procedure can be found elsewhere. 45,50 The permittivity of a 100 nm thick TiN film and the effective permittivities of TiN nanotrench structures for mid-IR wavelengths are characterized by the free-space reflection spectra. The spectra were fitted by the Drude−Lorentz model using the RefFit software based on the transfer matrix method 51,52…”

Section: Retrieval Of Tin Permittivitymentioning

confidence: 99%

“…Titanium nitride (TiN) is a plasmonic material whose permittivity becomes negative, even from visible wavelengths. It has recently been developed as an alternative plasmonic material for visible to near-IR wavelengths. − TiN is also plasmonic for a broad spectrum of mid-IR wavelengths. , However, to the best of our knowledge, a TiN-based nanostructure has not been tested for SEIRA applications to date.…”

Section: Introductionmentioning

confidence: 99%

“…41−43 TiN is also plasmonic for a broad spectrum of mid-IR wavelengths. 44,45 However, to the best of our knowledge, a TiN-based nanostructure has not been tested for SEIRA applications to date.…”

Section: Introductionmentioning

confidence: 99%

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Titanium Nitride Nanotrench Metasurfaces for Mid-infrared Chemical Sensing

Beliaev,

Shkondin,

Lavrinenko

et al. 2023

ACS Appl. Opt. Mater.

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Mid-infrared vibrational spectroscopy exploits characteristic infrared absorption features of molecules and chemical bondings, providing a powerful sensing tool to detect molecules. However, the challenge lies in the relatively weak light−matter interaction, leading to small absorption signatures. Plasmonic metasurfaces made of metal nanostructures are able to localize light, enhance light−matter interactions, and thus enable increasing mid-infrared light absorption by molecules. We demonstrate the enhancement of infrared absorption of vanillin molecules by plasmonic titanium nitride trench-based metasurfaces with a high aspect ratio, which outperforms that of silicon samples with similar geometrical parameters. A 70% extra absorption signal by plasmonic structures is due to stronger electric fields within the deep subwavelength trenches. Titanium nitride trench nanostructures may serve as a highly sensitive chemical sensing platform for mid-infrared absorption spectroscopy.

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Epsilon‐negative materials with lower percolation threshold derived from segregated structures

Yuan,

Yang,

Wang

et al. 2024

Polymer Composites

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Epsilon‐negative materials (ENM) at radio frequency, usually designed based on percolation theory, recently drew much attention because of their potential applications in capacitors, transistors, and antennas. However, randomly distributed conductive functional materials cannot achieve directional long‐range electron transportation within the material, resulting in decreased utilization efficiency. The morphology design of the substrate material can change the distribution state and electron transfer pathway of conductive fillers. By controlling the size of the polystyrene (PS) and the content of multi‐walled carbon nanotubes (MWCNTs), PS/MWCNTs composites with random structures and segregated structures were designed, both of which exhibited negative permittivity with increasing MWCNTs content. Further investigation revealed that negative permittivity behavior is due to the establishment of the conductive network and the plasma oscillation of free electrons. Moreover, components with segregated structures have lower percolation thresholds, as directional electron transport is achieved and conductive fillers are efficiently utilized. This work provides a new method for guiding the electron transport pathway and effectively changing the distribution state of conductive fillers in ENM.Highlights Negative permittivity is achieved by plasma oscillation at radio frequency. The segregated structure leads to a decrease in the percolation threshold. Epsilon‐negative materials have good prospects in inductive components.

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Optical properties of plasmonic titanium nitride thin films from ultraviolet to mid-infrared wavelengths deposited by pulsed-DC sputtering, thermal and plasma-enhanced atomic layer deposition

Cited by 7 publications

References 73 publications

Stoichiometry-Led Electronic Structure Reconstruction Finetunes the Color Characteristics of Titanium Nitride Thin Films

Stoichiometry-Led Electronic Structure Reconstruction Finetunes the Color Characteristics of Titanium Nitride Thin Films

Titanium Nitride Nanotrench Metasurfaces for Mid-infrared Chemical Sensing

Epsilon‐negative materials with lower percolation threshold derived from segregated structures

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