Spatial characterization of an IPVD reactor: neutral gas temperature and interpretation of optical spectroscopy measurements

Poucques, Ludovic de; Imbert, Jean-Christophe; Boisse‐Laporte, C.; Vašina, Petr; Bretagne, J.; Teulé‐Gay, Lionel; Touzeau, M.

doi:10.1088/0963-0252/14/2/014

Cited by 19 publications

(28 citation statements)

References 23 publications

(31 reference statements)

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“…The emitted light is collected by a quartz optical fiber and analysed through a photomultiplier tube by a Jobin-Yvon HR1000 spectrometer (1200 grooves mm − 1 grating, 1000 mm focal length). A reliable technique, the resonant optical absorption spectroscopy, has already been used in our laboratory [16,17]. The complete method and algorithm used for the determination of densities were previously described in [16].…”

Section: Experimental Set-upmentioning

confidence: 99%

Experimental study of a radio-frequency Ionized Physical Vapour Deposition process: Contamination by the internal coil

et al. 2008

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Section: Experimental Set-upmentioning

confidence: 99%

Experimental study of a radio-frequency Ionized Physical Vapour Deposition process: Contamination by the internal coil

et al. 2008

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“…Only few studies using such techniques have been performed on sputtered atoms such as aluminum (Al) [9,10] and titanium (Ti) atoms [11][12][13][14][15][16][17]. In this work, new measurements on W atoms are presented.…”

Section: Introductionmentioning

confidence: 99%

Characterization of energetic and thermalized sputtered tungsten atoms using tuneable diode-laser induced fluorescence in direct current magnetron discharge

Desecures¹,

Poucques²,

Bougdira³

2014

Plasma Sources Sci. Technol.

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In this study a tuneable diode-laser induced fluorescence (TD-LIF) technique (λ 0 = 407.4358 nm) is used to determine the atoms' velocity distribution function (AVDF) of energetic and thermalized sputtered tungsten (W) atoms in direct current magnetron discharge. The AVDF is characterized by probing the plasma above the centre of the target racetrack along the magnetron cathode axis in an argon-helium (Ar-He) mixture. Quantitative absorption measurements corroborated by deposition on silicon substrates are used to calibrate the TD-LIF relative measurements. Density, flux, temperature, AVDF and the flux velocity distribution function are derived from fitting the TD-LIF signals with four Gaussians (thermalized atoms) and four (energetic atom) functions (Stepanova and Dew 2004 Nucl. Instrum. Methods Phys. Res. B 215 357) taking into account the natural abundance and resonance wavelength shifts of the four main isotopes. Measurements show transport improvement for W atoms and an increase of the ratio of Ar ions to Ar neutrals with the increase of the percentage of He. All measurements are performed at 0.4 Pa and 100 W. The mean velocity of energetic W atoms typically ranges from 1900 to 2200 m s −1. The densities of thermalized and energetic atoms are in the same order of magnitude (∼10 9 cm −3) and their corresponding fluxes are several tens of times higher for energetic atoms (∼10 15 cm −2 s −1).

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“…Indeed, at low pressure, the mean free path of sputtered particles is high. That does not provides enough collisions between the sputtered atoms and the electrons of the additional plasma to efficiently ionise the vapour 8. At 13 Pa, the ionic line is observed for a low power on the coil (50 W) and ionic to neutral ratio increases greatly with the power.…”

Section: Resultsmentioning

confidence: 99%

RF‐Ionised Physical Vapour Deposition for Cu Thin Films: Deposition on Polymer Substrate

Guesmi

Poucques

Teulé‐Gay

et al. 2009

Plasma Processes & Polymers

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Ionised physical vapour deposition (IPVD), performed with a magnetron and a one‐loop radio frequency (RF) coil, was used to deposit copper thin films on polymer substrates in order to cover complex shapes. This process allows improving the films conformity and their resistivity by ionising the sputtered vapour. The coil coupling was adapted in order to optimise the process. The film resistivity is influenced by the RF power and the pressure. A substrate cleaning phase, required to obtain good film adhesion, was done using the RF coil. The influence of treatment parameters (pressure, RF power, duration) was studied on the adhesion. Optical emission and absorption spectroscopy were performed to identify and quantify neutral and ionic copper species in the plasma and furthermore to study the influence of the coil on the vapour properties.

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Spatial characterization of an IPVD reactor: neutral gas temperature and interpretation of optical spectroscopy measurements

Cited by 19 publications

References 23 publications

Experimental study of a radio-frequency Ionized Physical Vapour Deposition process: Contamination by the internal coil

Experimental study of a radio-frequency Ionized Physical Vapour Deposition process: Contamination by the internal coil

Characterization of energetic and thermalized sputtered tungsten atoms using tuneable diode-laser induced fluorescence in direct current magnetron discharge

RF‐Ionised Physical Vapour Deposition for Cu Thin Films: Deposition on Polymer Substrate

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