This paper deals with the diagnostics of a high power pulsed magnetron sputtering device (HPPMS). The HPPMS plasma was spatially and temporally characterized in the post-discharge using optical absorption spectroscopy and Langmuir probe time resolved measurements. A circular titanium target was used, the buffer gas was argon and the pressure was fixed at 4 Pa. The titanium densities (neutrals and ions) were measured by a pulsed resonant absorption spectroscopy technique. We found an ionization degree higher than 0.5. Comparison beetween the experimental results and a simple one-dimensional model of diffusion shows that in these conditions, the transport of neutral and ionized sputtered atoms is mainly controlled by diffusion (ambipolar diffusion for ions).

This paper is focused on experimental studies of a high power pulsed magnetron discharge stabilized by low current pre-ionization. Time resolved studies were performed for a Cu target by optical emission spectroscopy and electrical measurements for different pressures of Ar buffer gas. Due to the elimination of the statistical delay time and a fast discharge current rise the quasi-stationary state was reached in 6 µs. The quasi-stationary state is characterized by an extremely high and pressure independent discharge current density of ∼10 A cm −2 and stable Cu + and Cu ++ emissions. Such fast discharge dynamics permits the magnetron cathode current to be driven with a pulse of duration of the order of a few µs, significantly shorter than in other devices. During this short time, the plasma does not have time to undergo the transition from the glow to the arc discharge even at the extremely high cathode loads met in our case. Different stages of the fast discharge development are identified and the composition of the magnetized plasma as a function of the pressure is discussed in detail.

A high-power pulsed-magnetron discharge (several kW/cm 2 ) is described. It operates at pulse duration of the order of few µs, significantly shorter than in usual similar devices. The breakdown delay was reduced by using a low-current DC preionization. The study was performed for Cu target in Ar and He buffer gases by optical emission spectroscopy and electrical measurements. Saturation magnetron current is reached in a few µs which permits to shorten the pulse duration avoiding arc formation. Unusual high current density up to 10 A/cm 2 induces very fast transition toward the stable self-sputtering regime. High plasma density favours high ion flux to the substrate. Preliminary result on Cu deposit in trenches is reported.