2018
DOI: 10.1016/j.sse.2017.12.005
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Solution processed thin film transistor from liquid phase exfoliated MoS2 flakes

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Cited by 24 publications
(21 citation statements)
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“…512 ± 12 meV and 360 ± 10 meV, respectively. EA of hundreds of meV reflect the energy necessary to overcome the inter-flake barriers in MoS2 systems 26 , rather than low-energy (tens of meV) intra-flake conduction states 26 . By sweeping VG Back from -60 to +60 V, the T-dependent charge carrier mobility µ(T) of films and networks follows an Arrhenius relation, with lower EA for networks (Supplementary Fig.…”
Section: Temperature-dependent Electrical Characteristicsmentioning
confidence: 99%
See 1 more Smart Citation
“…512 ± 12 meV and 360 ± 10 meV, respectively. EA of hundreds of meV reflect the energy necessary to overcome the inter-flake barriers in MoS2 systems 26 , rather than low-energy (tens of meV) intra-flake conduction states 26 . By sweeping VG Back from -60 to +60 V, the T-dependent charge carrier mobility µ(T) of films and networks follows an Arrhenius relation, with lower EA for networks (Supplementary Fig.…”
Section: Temperature-dependent Electrical Characteristicsmentioning
confidence: 99%
“…In the case of electronic applications based on individual flakes, a promising strategy exploits thiolated molecular systems to heal sulfur vacancies (VS) in transition metal disulfides (MS2), thereby restoring the material pristine crystal structure and enhancing its electrical properties 23,24 . Nevertheless, in thin-film TMD-based devices, an additional and limiting factor related to the inter-flake electrical resistance emerges, resulting in a significant hindrance of charge carrier transport 25,26 . This represents a major bottleneck in the development of solution-processed TMD-based optoelectronics, especially in large-area and high-performance device applications.…”
mentioning
confidence: 99%
“…201 To enhance exibility, polymer encapsulation has been used in MoS 2 -based FETs. 203,204 The additional polymer layer induces mechanical strain at the interface that contributes to reducing the surface adsorbates and gaining contact areas. In addition to the encapsulation, researchers have developed several novel device geometries to inhibit the defects.…”
Section: Thin Lm Transistors (Tfts)mentioning
confidence: 99%
“…The carrier mobility of TFTs made by this method is 0.4 cm 2 V −1 s −1 . In another work, MoS 2 from a two-step liquid-phase exfoliation (LPE) method was sprayed onto the substrates as channels in TFTs [55]. The carrier mobility of this TFT was 10 −4 cm 2 V −1 s −1 , a relatively low value.…”
Section: Tftsmentioning
confidence: 99%