Using a facing target sputtering equipment, FeTiN films were deposited on water‐cooled and heated substrates under different nitrogen flow ratios, R(N2). The composition, microstructure, and magnetic properties of the films were investigated by Auger electron spectroscopy (AES), X‐ray photoelectron spectroscopy (XPS), X‐ray diffraction (XRD), and a vibrating sample magnetometer (VSM). The films consist of α‐Fe, TiNx, and Fe4N, where the volume fraction of these phases varies with R(N2) and the substrate temperature during sputtering. The α‐Fe(Ti) films with supersaturated nitrogen exhibit a larger Ms than the Fe‐Ti films. However, Hc first decreases and then increases with increasing R(N2). This is ascribed to a distortion of the α‐Fe lattice due to doping of Ti atoms and the compressive stress caused by the incorporation of sufficient nitrogen atoms.