Structure and magnetic properties of FeTiN films deposited by dc magnetron facing target sputtering

Abstract

Using a facing target sputtering equipment, FeTiN films were deposited on water‐cooled and heated substrates under different nitrogen flow ratios, R(N2). The composition, microstructure, and magnetic properties of the films were investigated by Auger electron spectroscopy (AES), X‐ray photoelectron spectroscopy (XPS), X‐ray diffraction (XRD), and a vibrating sample magnetometer (VSM). The films consist of α‐Fe, TiNx, and Fe4N, where the volume fraction of these phases varies with R(N2) and the substrate temperature during sputtering. The α‐Fe(Ti) films with supersaturated nitrogen exhibit a larger Ms than the Fe‐Ti films. However, Hc first decreases and then increases with increasing R(N2). This is ascribed to a distortion of the α‐Fe lattice due to doping of Ti atoms and the compressive stress caused by the incorporation of sufficient nitrogen atoms.

Facile Synthesis of Highly Photoactive α-Fe2O3-Based Films for Water Oxidation

“…This shoulder does not match the binding energy of metallic Fe (706.7À707.1 eV 34,35 ), FeOOH, or any of the other oxides discussed above. We speculate that it might be due to the presence of FeÀC or FeÀTi bonds in the Ti-doped sample; Peng et al reported 706.9 eV as the Fe 2p 3/2 binding energy in FeÀTi and FeÀTiÀN thin films, 39 and the Fe 2p 3/2 binding energy for Fe 3 C is reported to be 708.1 eV. 34 Figure 3d shows the O 1s XPS spectra collected from the doped and undoped R-Fe 2 O 3 films.…”