Proceedings of the 25th International Workshop on Vertex Detectors — PoS(Vertex 2016) 2017
DOI: 10.22323/1.287.0028
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Small pitch 3D devices

Abstract: 3D sensors are a promising option for the innermost pixel layers at the High Luminosity LHC. However, the required very high hit-rate capabilities, increased pixel granularity, extreme radiation hardness, and reduced material budget call for a device downscale as compared to existing 3D sensors, involving smaller pitch (e.g., 50×50 or 25×100 µm 2 ), shorter inter-electrode spacing (~30 µm), narrower electrodes (~5 µm), and reduced active thickness (~100 µm). The development of a new generation of 3D pixel sens… Show more

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Cited by 9 publications
(8 citation statements)
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“…Columnar 3D pixel sensors [4,5] possess several intrinsic properties making them good candidates to create the layers of Figure 1: Schematic diagram of a planar (left) and a 3D (right) sensor, showing the charge carrier creation when a particle passes through, and the carriers movement before being collected on the electrodes. a tracking system exposed to an extreme radiation environment.…”
Section: Radiation Hardness and 3d Columnar Pixel Sensorsmentioning
confidence: 99%
See 1 more Smart Citation
“…Columnar 3D pixel sensors [4,5] possess several intrinsic properties making them good candidates to create the layers of Figure 1: Schematic diagram of a planar (left) and a 3D (right) sensor, showing the charge carrier creation when a particle passes through, and the carriers movement before being collected on the electrodes. a tracking system exposed to an extreme radiation environment.…”
Section: Radiation Hardness and 3d Columnar Pixel Sensorsmentioning
confidence: 99%
“…Detector and fabrication description can be found on ref. [4,5]. Figure 2 shows both single-sided FBK and double-sided IMB-CNM pixel layout sensors.…”
Section: Radiation Hardness and 3d Columnar Pixel Sensorsmentioning
confidence: 99%
“…Results on 3D Pixel Sensors for the CMS Upgrade at the HL-LHC developed in a collaboration with the Istituto Nazionale di Fisica Nucleare (INFN) [2]. The silicon wafers were produced with the Silicon-Silicon Direct Wafer Bond (DWB) technique.…”
Section: Pos(pixel2022)046mentioning
confidence: 99%
“…The 3D sensors in our R&D program [3], are developed and fabricated in the framework of INFN and FBK collaboration activity [4]. The substrates are p-type Si-Si Direct Bond Wafers (DBW), with a support wafer made of 500 µm thick, less than 1 Ohm cm resistivity, Czochralski (CZ) silicon.…”
Section: The Fbk 3d Pixel Sensorsmentioning
confidence: 99%