Silicon nanoparticle formation depending on the discharge conditions of an atmospheric radio-frequency driven microplasma with argon/silane/hydrogen gases

Barwe, Barbara; Riedel, Frederik; Cibulka, Ondřej; Pelant, I.; Benedikt, Jan

doi:10.1088/0022-3727/48/31/314001

Cited by 23 publications

(18 citation statements)

References 30 publications

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“…Some typical types of APPs include dielectric barrier discharge (DBD), corona discharge, atmospheric pressure plasma jets (APPJs), and microplasmas. Various plasma excitation techniques can produce APPs with different gas temperatures and charge densities; the synergetic effects of a highly energetic plasma species and temperature can achieve versatile functions in material processing [3][4][5][6][7][8][9][10][11].…”

Section: Introductionmentioning

confidence: 99%

Atmospheric-Pressure Plasma Jet Processed Pt-Decorated Reduced Graphene Oxides for Counter-Electrodes of Dye-Sensitized Solar Cells

et al. 2016

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Ultrafast atmospheric-pressure plasma jet (APPJ) processed Pt-decorated reduced graphene oxides (rGOs) were used as counter-electrodes in dye-sensitized solar cells (DSSCs). Pastes containing rGO, ethyl cellulose, terpineol, and chloroplatinic acid were screen-printed and sintered by nitrogen dc-pulse APPJs. Pt nanodots were uniformly distributed on the rGO flakes. When using Pt-decorated rGOs as the counter electrodes of DSSCs, the efficiency of the DSSC first increased and then decreased as the APPJ processing time increased. Nitrogen APPJs can effectively remove organic binders and can reduce chloroplatinic acid to Pt, thereby improving the efficiency of DSSCs. However, over-calcination by APPJ can damage the graphenes and degrade the DSSCs. The addition of Pt mainly improves the fill factor, which thereby increases the efficiency of DSSCs. The optimized APPJ processing time was merely 9 s owing to the vigorous interaction among the rGOs, chloroplatinic acid and nitrogen APPJs.

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Section: Introductionmentioning

confidence: 99%

Atmospheric-Pressure Plasma Jet Processed Pt-Decorated Reduced Graphene Oxides for Counter-Electrodes of Dye-Sensitized Solar Cells

et al. 2016

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“…Hence, the independent adjustment of the morphological and chemical film properties by variation of the process parameters at atmospheric pressure is a challenging task. Much of current effort is dedicated to this issue [4,5]. In particular, a stability against chemical or mechanical impact is desirable for coatings in a wide range of morphologies.…”

Section: Introductionmentioning

confidence: 99%

Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure

Schäfer

Hnilica

Šperka

et al. 2016

Surface and Coatings Technology

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a b s t r a c t a r t i c l e i n f oPlasma enhanced chemical vapor deposition (PECVD) from tetrakis(trimethylsilyloxy)silane (TTMS) has been studied at atmospheric pressure. TTMS has been chosen because of its unique 3D structure with potential to form nano-structured organosilicon polymers. Despite the widespread surveying of various silicon-organic molecules for PECVD, the use of TTMS in AP-PECVD has not been investigated deeper yet. PECVDs have been performed with two different plasma jets. While they are alike regarding the geometry and injection of TTMS, they differ in input power and excitation frequency. The radiofrequency plasma jet operates at lower power densities as compared to the microwave plasma jet. Despite this all the deposited films exhibit similar chemical properties resembling that of silicon dioxide (Si:O = 1:2) with carbon content below 5%. The films demonstrate a broad variety of morphologies from compact smooth films to nano-dendritic 3D structures depending on the particular process.

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“…Nucleation, growth, and nanoparticle heating are mechanisms closely related in APPs. Although further confirmation will be required, nucleation in APPs appears to take place via super‐saturation of silicon atoms rather than through a polymerization process of SiH x radicals as observed in low‐pressure plasmas; this is partly supported by strong emission of atomic silicon lines in silane‐based APPs . Therefore full silane dissociation is necessary in APPs to achieve crystalline Si QDs.…”

Section: Photovoltaic Materials By Atmospheric Pressure Plasmasmentioning

confidence: 99%

Low‐Temperature Atmospheric Pressure Plasma Processes for “Green” Third Generation Photovoltaics

Mariotti

Belmonte

Benedikt

et al. 2016

Plasma Processes & Polymers

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Atmospheric pressure plasmas (APPs) have achieved great scientific and technological advances for a wide range of applications. The synthesis and treatment of materials by APPs have always attracted great attention due to potential economic benefits if compared to low-pressure plasma processes. Nonetheless, APPs present very distinctive features that suggest atmospheric pressure operation could bring other benefits for emerging new technologies. In particular, materials synthesized by APPs which are suitable candidates for third generation photovoltaics are reviewed here.

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Silicon nanoparticle formation depending on the discharge conditions of an atmospheric radio-frequency driven microplasma with argon/silane/hydrogen gases

Cited by 23 publications

References 30 publications

Atmospheric-Pressure Plasma Jet Processed Pt-Decorated Reduced Graphene Oxides for Counter-Electrodes of Dye-Sensitized Solar Cells

Atmospheric-Pressure Plasma Jet Processed Pt-Decorated Reduced Graphene Oxides for Counter-Electrodes of Dye-Sensitized Solar Cells

Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure

Low‐Temperature Atmospheric Pressure Plasma Processes for “Green” Third Generation Photovoltaics

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