2013
DOI: 10.1016/j.apsusc.2012.09.171
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Significant effect of substrate temperature on the phase structure, optical and electrical properties of RF sputtered CIGS films

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Cited by 31 publications
(4 citation statements)
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“…The absorption enhancement in the near-infrared region (~700-2500 nm) for the samples grown with the temperature of 150 0 C and 300 0 C is the most remarkable observation at first glance. As compatible with the literature [33], the fact that crystallinity is improved even at low temperatures (150 0 C) could be expressed as the main reason for the higher absorption. On the other hand, the slight increment in absorption for each film deposited with a higher incident angle of 60 0 compared to its counterpart film obtained with a lower angle of 40 0 is another important observation that should be evaluated.…”
Section: Resultssupporting
confidence: 85%
“…The absorption enhancement in the near-infrared region (~700-2500 nm) for the samples grown with the temperature of 150 0 C and 300 0 C is the most remarkable observation at first glance. As compatible with the literature [33], the fact that crystallinity is improved even at low temperatures (150 0 C) could be expressed as the main reason for the higher absorption. On the other hand, the slight increment in absorption for each film deposited with a higher incident angle of 60 0 compared to its counterpart film obtained with a lower angle of 40 0 is another important observation that should be evaluated.…”
Section: Resultssupporting
confidence: 85%
“…In our previous study [10], we reported on the effect of T sub on the CIGS film properties and found that a T sub of 350°C produces a single chalcopyrite phase CIGS film. Unfortunately, all the 80 W-deposited films are deficient in Se due to Se's re-evaporation, and thus unsuitable for absorber layers.…”
Section: Introductionmentioning
confidence: 96%
“…Recently, efforts have been made to fabricate CIGS layers by sputtering. To further reduce the fabrication costs, a one-step sputtering has been developed [7][8][9][10] to deposit CIGS films without selenization. Frantz et al [7] prepared CIGS solar cell with an efficiency of up to 8.9 % through one-step radio frequency (RF) sputtering at T sub of 550°C.…”
Section: Introductionmentioning
confidence: 99%
“…Moreover, the grain size depends not only on the temperature but also on other parameters, such as GGI ratio, sputtering pressure, and power [34]. Yu et al [35] found the average grain size of 200 nm for the substrate temperature equaled 350 • C. Peace et al [12] found that the grain size of the CIGS decreased with the increase of gallium content. The highest GGI (0.41) resulted in the smallest grains of size 41 nm.…”
Section: Discussionmentioning
confidence: 99%