Abstract:Low-and room-temperature optical absorption spectra are presented for a series of InAs x P 1Ϫx /InP strainedlayer multiple quantum well structures ͑0.11 рxр0.35͒ grown by low-pressure metal-organic vapor phase epitaxy using trimethylindium, tertiarybutylarsine, and phosphine as precursors. The well widths and compositions in these structures are exactly determined from the use of both high-resolution x-ray diffraction and transmission electron microscopy on the same samples. The absorption spectra are then ana… Show more
“…[6][7][8] Also reported [8][9][10][11][12][13][14][15][16] is the optoelectronic and material growth, including InAsP/InP strained-quantum wells. For InAs y P 1Ϫy , the band gap and its temperature dependence are essential material parameters in the design and fabrication of devices as well as the determination of epitaxial growth conditions.…”
The temperature dependence of the band gap in InAsyP1−y (y=0–0.67) has been determined by photoluminescence, x-ray diffraction, and absorption spectra measurements. We found that the measured data within the temperature range of 77–300 K can be expressed by the equation proposed by O’Donnell and Chen. The band gap at 77 K is given by Eg=1.407−1.073y+0.089y2, while the compositional dependence of the band gap observed at 300 K, agrees with the values previously reported. We confirmed that changes in temperature caused a slight change in the bowing parameters, and hence found that the band gap temperature dependence of InAsyP1−y (y=0–1) varies very little with changes in composition (2.5–3.5×10−4 eV/K).
“…[6][7][8] Also reported [8][9][10][11][12][13][14][15][16] is the optoelectronic and material growth, including InAsP/InP strained-quantum wells. For InAs y P 1Ϫy , the band gap and its temperature dependence are essential material parameters in the design and fabrication of devices as well as the determination of epitaxial growth conditions.…”
The temperature dependence of the band gap in InAsyP1−y (y=0–0.67) has been determined by photoluminescence, x-ray diffraction, and absorption spectra measurements. We found that the measured data within the temperature range of 77–300 K can be expressed by the equation proposed by O’Donnell and Chen. The band gap at 77 K is given by Eg=1.407−1.073y+0.089y2, while the compositional dependence of the band gap observed at 300 K, agrees with the values previously reported. We confirmed that changes in temperature caused a slight change in the bowing parameters, and hence found that the band gap temperature dependence of InAsyP1−y (y=0–1) varies very little with changes in composition (2.5–3.5×10−4 eV/K).
“…The descriptions of the strain given by [8] and [9] are based on the deformation potential of Pikus and Bir [10]. Such a deformation potential has been applied to spatially distributed strains, e.g.…”
Section: Theoretical Analysis Of Strain and Optical Transitionsmentioning
“…[1][2][3] InAs y P 1Ϫy alloys are also of interest for compositionally graded buffer applications, where the span of lattice constants between InP and InAs provides the opportunity for generating ''virtual substrates'' on InP to support a wide variety of lattice-mismatched devices based on In x Ga 1Ϫx As, In x Al 1Ϫx As, and InAs y P 1Ϫy . This is currently being explored for thermophotovoltaic ͑TPV͒ devices based on In x Ga 1Ϫx As, where the band gaps required for optimal TPV system conversion efficiencies in the range of 0.5-0.6 eV necessitate In x Ga 1Ϫx As compositions (xϭ0.69-0.81) that generate a significant lattice mismatch with respect to the InP substrate.…”
Relaxed, high-quality, compositionally step-graded InAsyP1−y layers with an As composition of y=0.4, corresponding to a lattice mismatch of ∼1.3% were grown on InP substrates using solid-source molecular-beam epitaxy. Each layer was found to be nearly fully relaxed observed by triple axis x-ray diffraction, and plan-view transmission electron microscopy revealed an average threading dislocations of 4×106 cm−2 within the InAs0.4P0.6 cap layer. Extremely ordered crosshatch morphology was observed with very low surface roughness (3.16 nm) compared to cation-based In0.7Al0.3As/InxAl1−xAs/InP graded buffers (10.53 nm) with similar mismatch and span of lattice constants on InP. The results show that InAsyP1−y graded buffers on InP are promising candidates as virtual substrates for infrared and high-speed metamorphic III–V devices.
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