“…Manganite thin lms with a wide range of nominal thickness, t (3 nm < t < 250 nm), exhibiting self-organized surface nanopits, were grown by RF magnetron sputtering at a high temperature (900 C) under a pure oxygen pressure of 19 Pa. The pits size (in-plane diameter), s, and density, r, can be controlled within the ranges r $ 100 to 400 pits per mm 2 and s $ 20 to 60 nm by adjusting the growth rate through the voltage bias, 19 the substrate miscut angle and the mist value by substrate choice. 20 Here we study lms grown on top of the STO substrates at a voltage bias of $120 V corresponding to a growth rate of $1 nm min À1 .…”