2010
DOI: 10.1016/j.jallcom.2010.04.225
|View full text |Cite
|
Sign up to set email alerts
|

Lateral parameter variations on the properties of La0.7Sr0.3MnO3 films prepared on Si (100) substrates by dc magnetron sputtering

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
5

Citation Types

0
7
0

Year Published

2011
2011
2023
2023

Publication Types

Select...
7
1

Relationship

0
8

Authors

Journals

citations
Cited by 13 publications
(7 citation statements)
references
References 49 publications
(53 reference statements)
0
7
0
Order By: Relevance
“…In order to obtain high quality LSMO thin films with magnetron sputtering, researchers have adjusted various parameters, such as annealing temperature, working pressure and substrates [15][16][17]. Annealing temperature has a great influence on the crystallization progress of LSMO thin films.…”
Section: Introductionmentioning
confidence: 99%
“…In order to obtain high quality LSMO thin films with magnetron sputtering, researchers have adjusted various parameters, such as annealing temperature, working pressure and substrates [15][16][17]. Annealing temperature has a great influence on the crystallization progress of LSMO thin films.…”
Section: Introductionmentioning
confidence: 99%
“…For a better understanding of CMR a large number of studies have been carried out in single crystals [6], thin films [7,8], polycrystalline CMR materials [9,10] and CMR-based composites [11][12][13][14][15][16][17][18]. Many groups have attempted to synthesize CMR-insulator composites, such as La 0.67 Ca 0.33 MnO 3 (LCMO)-MgO [11], LCMO-BaTiO 3 (BTO) [12,13], LCMO-Al 2 O 3 [14,15], La 0.67 Sr 0.33 MnO 3 -La 2 O 3 -La(OH) 3 [16], La 0.67 Sr 0.33 MnO 3 -polyaniline [17] and LCMO-SrTiO 3 (STO) [18], etc.…”
Section: Introductionmentioning
confidence: 99%
“…There is potential for the application of La 1 - x Sr x MnO 3 (LSMO) in the magnetic storage device and spin-sensitive device field, or it can be used as an important hole-doping material to construct microelectronic devices [2,4,5]. To realize nanodevice applications with high efficiency, it is imperative that LSMO thin films be fabricated on a nanometric scale.…”
Section: Introductionmentioning
confidence: 99%