Scanning probe microscope dimensional metrology at NIST

Kramar, John A.; Dixson, Ronald G.; Orji, Ndubuisi G.

doi:10.1088/0957-0233/22/2/024001

Cited by 53 publications

(37 citation statements)

References 33 publications

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“…1, which defines the coordinate system of the instrument. Experience in characterizing mSPMs at other metrology institutes [4][5][6][7][8][9] has shown that the metrological frame is the dominant source of measurement uncertainties arising from alignment errors, particularly Abbé errors and nonorthogonality of the measurement axes, and environmental vibration. To achieve the target total uncertainty of dimensional measurements, minimizing these contributions is a principal consideration in the design of the metrological frame and the material selected for its construction.…”

Section: System Integrationmentioning

confidence: 99%

“…1,2 The challenge in realizing this mSPM concept is to create a macroscopic mechanical instrument capable of traceable dimensional measurement at the nanoscale with a combined uncertainty of less than 1 nm. Experience in designing ultraprecision mechanical stages and instruments 3 and in operating similar mSPMs at other metrology institutes [4][5][6][7][8][9] has shown that there are many contributions to the uncertainty of the displacement measurements. These include alignment errors (particularly Abbé errors 10 ), deformations of the mechanical structures (for instance, due to thermal expansion), motion errors of the translation stage, form errors of the interferometer mirrors, nonlinearities of the interferometers, and fluctuations in the refractive index of air.…”

Section: Introductionmentioning

confidence: 99%

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Metrological scanning probe microscope based on a quartz tuning fork detector

Babić

Freund

Herrmann

et al. 2012

J. Micro/Nanolith. MEMS MOEMS

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Abstract. We give an overview of the design of a metrological scanning probe microscope (mSPM) currently under development at the National Measurement Institute Australia (NMIA) and report on preliminary results on the implementation of key components. The mSPM is being developed as part of the nanometrology program at NMIA and will provide the link in the traceability chain between dimensional measurements made at the nanometer scale and the realization of the International System of Units (SI) meter at NMIA. The instrument is based on a quartz tuning fork (QTF) detector and will provide a measurement volume of 100 μm × 100 μm × 25 μm with a target uncertainty of 1 nm for the position measurement. Characterization results of the nanopositioning stage and the QTF detector are presented along with an outline of the method for tip mounting on the QTFs. Initial imaging results are also presented. © 2012Society of Photo-Optical Instrumentation Engineers (SPIE).

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Section: System Integrationmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Metrological scanning probe microscope based on a quartz tuning fork detector

Babić

Freund

Herrmann

et al. 2012

J. Micro/Nanolith. MEMS MOEMS

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“…It is intended primarily to calibrate physical standards for other AFMs. The design, performance, and uncertainties of the system have been discussed elsewhere [1,[4][5][6]. The C-AFM has metrology traceability to the SI meter in all three axes via the 633 nm wavelength of an I 2 -stabilized He-Ne laser.…”

Section: The Nist Calibrated Atomic Force Microscope (C-afm)mentioning

confidence: 99%

Interlaboratory comparison of traceable atomic force microscope pitch measurements

Dixson

Chernoff²,

Wang

et al. 2010

Scanning Microscopy 2010

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The National Institute of Standards and Technology (NIST), Advanced Surface Microscopy (ASM), and the National Metrology Centre (NMC) of the Agency for Science, Technology, and Research (A*STAR) in Singapore have completed a three-way interlaboratory comparison of traceable pitch measurements using atomic force microscopy (AFM). The specimen being used for this comparison is provided by ASM and consists of SiO 2 lines having a 70 nm pitch patterned on a silicon substrate.NIST has a multifaceted program in atomic force microscope (AFM) dimensional metrology. One component of this effort is a custom in-house metrology AFM, called the calibrated AFM (C-AFM). The NIST C-AFM has displacement metrology for all three axes traceable to the 633 nm wavelength of the iodine-stabilized He-Ne laser -a recommended wavelength for realization of the SI (Système International d'Unités, or International System of Units) meter. NIST used the C-AFM to participate in this comparison.ASM used a commercially available AFM with an open-loop scanner, calibrated by a 144 nm pitch transfer standard. In a prior collaboration with Physikalisch-Technische Bundesanstalt (PTB), the German national metrology institute, ASM's transfer standard was calibrated using PTB's traceable optical diffractometry instrument. Thus, ASM's measurements are also traceable to the SI meter.NMC/A*STAR used a large scanning range metrological atomic force microscope (LRM-AFM). The LRM-AFM integrates an AFM scanning head into a nano-stage equipped with three built-in He-Ne laser interferometers so that its measurement related to the motion on all three axes is directly traceable to the SI meter.The measurements for this interlaboratory comparison have been completed and the results are in agreement within their expanded uncertainties and at the level of a few parts in 10 4 .

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“…Several laboratories and national metrology institutes (NMIs) have developed their own mAFMs, all these characterized by their on-board metrology systems and opto-mechanical set-ups [1][2][3][4][5][6][7][8][9][10]. These instruments make use of different arrangements and selected materials aiming at a good compromise between working volume, metrology loop, stiffness and overall thermal stability.…”

Section: Introductionmentioning

confidence: 99%

Recent advances of the metrological AFM at INRIM

Bellotti

Picotto

2014

Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VIII

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Traceable dimensional measurements of step-height and lateral standards, patterned surfaces, and particles at the nanoscale need of calibrated instruments such as the metrological AFMs. These instruments have onboard capacitive sensors or interferometers to control the relative tip-sample movements. Interferometers provide a direct traceability to the unit of length, at the cost of more complex set-ups. A new interferometer set-up has been developed to monitor tip-sample z-displacements of the instrument in use at INRIM. The interferometer is made of a compact and symmetric arrangement of the optics to fit available room and minimize the metrology loop. Preliminary results are reported together with the analysis of the main error sources of z-displacement measurements.

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Scanning probe microscope dimensional metrology at NIST

Cited by 53 publications

References 33 publications

Metrological scanning probe microscope based on a quartz tuning fork detector

Metrological scanning probe microscope based on a quartz tuning fork detector

Interlaboratory comparison of traceable atomic force microscope pitch measurements

Recent advances of the metrological AFM at INRIM

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