Roll-to-roll dielectric metasurfaces

Yin, Xinghui; Park, Joon-Suh; Stensvad, Karl; Brott, Robert L.; Rubin, Noah A.; Wolk, Martin; Capasso, Federico

doi:10.1117/12.2576210

Cited by 3 publications

(2 citation statements)

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“…The low cost of mass-production techniques is essential for bringing metasurfaces from laboratories to our daily lives. Efforts have been directed toward reducing the cost and enhancing the throughput of dielectric metasurfaces through methods such as nanoimprinting [95–97] , molecular self-assembly [98] , roll-to-roll [99] , and deep ultraviolet (DUV) lithography [100] processes. It is noteworthy that novel nanofabrication techniques have facilitated groundbreaking discoveries, as evidenced by the development of high-aspect-ratio [101] , flexible [102] , multilayer [103] , and slanted nanostructures [104] .…”

Section: Introductionmentioning

confidence: 99%

Advanced manufacturing of dielectric meta-devices

Yang,

Zhou,

Tsai

et al. 2024

Photonics Insights

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Section: Introductionmentioning

confidence: 99%

Advanced manufacturing of dielectric meta-devices

Yang,

Zhou,

Tsai

et al. 2024

Photonics Insights

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“…Recent developments in e-beam writing techniques using variable-shaped beam (VSB) and cell-projection (CP) allow metasurface structures to be written over a 280 mm diameter circle area in 36 hours . Nanoimprint lithography (NIL) is a viable technique for mass-producing metasurface optics or continuous metasurface films using metasurface patterns fabricated using e-beam lithography as molds. ,, A list of recent notable developments in scaling the diameter of metalenses is provided in Table S1.…”

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confidence: 99%

All-Glass 100 mm Diameter Visible Metalens for Imaging the Cosmos

Park,

Lim,

Amirzhan

et al. 2024

ACS Nano

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Metasurfaces, optics made from subwavelength-scale nanostructures, have been limited to millimeter-sizes by the scaling challenge of producing vast numbers of precisely engineered elements over a large area. In this study, we demonstrate an all-glass 100 mm diameter metasurface lens (metalens) comprising 18.7 billion nanostructures that operates in the visible spectrum with a fast f-number (f/1.5, NA = 0.32) using deep-ultraviolet (DUV) projection lithography. Our work overcomes the exposure area constraints of lithography tools and demonstrates that large metasurfaces are commercially feasible. Additionally, we investigate the impact of various fabrication errors on the imaging quality of the metalens, several of which are specific to such large area metasurfaces. We demonstrate direct astronomical imaging of the Sun, the Moon, and emission nebulae at visible wavelengths and validate the robustness of such metasurfaces under extreme environmental thermal swings for space applications.

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