Metalenses, planar lenses realized by placing subwavelength nanostructures that locally impart lenslike phase shifts to the incident light, are promising as a replacement for refractive optics for their ultrathin, lightweight, and tailorable characteristics, especially for applications where payload is of significant importance. However, the requirement of fabricating up to billions of subwavelength structures for centimeter-scale metalenses can constrain size-scalability and mass-production for large lenses. In this Letter, we demonstrate a centimeter-scale, all-glass metalens capable of focusing and imaging at visible wavelength, using deep-ultraviolet (DUV) projection stepper lithography. Here, we show size-scalability and potential for mass-production by fabricating 45 metalenses of 1 cm diameter on a 4 in. fused-silica wafer. The lenses show diffraction-limited focusing behavior for any homogeneously polarized incidence at visible wavelengths. The metalens’ performance is quantified by the Strehl ratio and the modulation transfer function (MTF), which are then compared with commercial refractive spherical and aspherical singlet lenses of similar size and focal length. We further explore the imaging capabilities of our metalens using a color-pixel sCMOS camera and scanning-imaging techniques, demonstrating potential applications for virtual reality (VR) devices or biological imaging techniques.

Although various colloidal quantum dot (QD) coating and patterning techniques have been developed to meet the demands in optoelectronic applications over the past years, each of the previously demonstrated methods has one or more limitations and trade-offs in forming multicolor, high-resolution, or large-area patterns of QDs. In this study, we present an alternative QD patterning technique using conventional photolithography combined with charge-assisted layer-by-layer (LbL) assembly to solve the trade-offs of the traditional patterning processes. From our demonstrations, we show repeatable QD patterning process that allows multicolor QD patterns in both large-area and microscale. Also, we show that the QD patterns are robust against additional photolithography processes and that the thickness of the QD patterns can be controlled at each position. To validate that this process can be applied to actual device applications as an active material, we have fabricated inverted, differently colored, active QD light-emitting device (QD-LED) on a pixelated substrate, which achieved maximum electroluminescence intensity of 23 770 cd/m, and discussed the results. From our findings, we believe that our process provides a solution to achieving both high-resolution and large-scale QD pattern applicable to not only display, but also to practical photonic device research and development.

Virtual and augmented realities are rapidly developing technologies, but their large-scale penetration will require lightweight optical components with small aberrations. We demonstrate millimeter-scale diameter, high-NA, submicron-thin, metasurface-based lenses that achieve diffraction-limited achromatic focusing of the primary colors by exploiting constructive interference of light from multiple zones and dispersion engineering. To illustrate the potential of this approach, we demonstrate a virtual reality system based on a home-built fiber scanning near-eye display.