“…Combined with nanoimprinting lithography, metasurfaces can be rapidly replicated from a master mold directly onto a substrate [126][127][128] . Other materials, including silicon nitride (Si 3 N 4 ) [75,129] , GaN [11,2,130,131] , zinc oxide (ZnO) [132,133] , germanium (Ge) [134,135] , silicon dioxide (SiO 2 ) [136][137][138] , and GaAs [139][140] , are also attractive options widely used in visible to NIR applications. For middle-IR applications, narrowband semiconductors like tellurium (Te) [141] , gallium antimonide (GaSb) [142] , and polar crystals such as silicon carbide (SiC) [143] have already been implemented for all-dielectric meta-devices operating with Mie resonances.…”