2020
DOI: 10.3390/ma13061400
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Review on III-V Semiconductor Single Nanowire-Based Room Temperature Infrared Photodetectors

Abstract: Recently, III-V semiconductor nanowires have been widely explored as promising candidates for high-performance photodetectors due to their one-dimensional morphology, direct and tunable bandgap, as well as unique optical and electrical properties. Here, the recent development of III-V semiconductor-based single nanowire photodetectors for infrared photodetection is reviewed and compared, including material synthesis, representative types (under different operation principles and novel concepts), and device per… Show more

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Cited by 53 publications
(43 citation statements)
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“…These new multilayered stacking architectures combined with advanced fabrication and growth techniques (e.g., molecular beam epitaxy and chemical vapor deposition), can significantly enhance the output of the III-nitride based UV sensors. [300][301][302][303] Examples of this approach include the work of Martens et al, which developed an Al 0.25 Ga 0.75 N/GaN-based UV photodetectors. The high conductivity of the 2D gas at the Al 0.25 Ga 0.75 N/GaN interfaces offers a high photocurrent in the milliampere-range and high gain optical switch.…”
Section: Ultraviolet Sensorsmentioning
confidence: 99%
“…These new multilayered stacking architectures combined with advanced fabrication and growth techniques (e.g., molecular beam epitaxy and chemical vapor deposition), can significantly enhance the output of the III-nitride based UV sensors. [300][301][302][303] Examples of this approach include the work of Martens et al, which developed an Al 0.25 Ga 0.75 N/GaN-based UV photodetectors. The high conductivity of the 2D gas at the Al 0.25 Ga 0.75 N/GaN interfaces offers a high photocurrent in the milliampere-range and high gain optical switch.…”
Section: Ultraviolet Sensorsmentioning
confidence: 99%
“…Therefore, the specific detectivity of the array detectors can be estimated using the Johnson noise and shot noise-limited detectivity: ,,, where A d is the NW array area, k is Boltzmann constant, T is the temperature, and R d is the dynamic resistance which is defined as . The peak detectivity of the array with D NW tip of 81, 108, and 128 nm at 1 V is 3.8 × 10 11 , 1.2 × 10 12 , and 5.8 × 10 11 cm √Hz/W, respectively, much higher than previously reported GaAsSb NW photodetectors , and most previously reported NW array photodetectors. , Moreover, compared with previously demonstrated Si NW array-based multispectral detectors, , our GaAsSb NW detectors show not only high performance but also a much broader spectral band extending to the IR region with more than 10 channels to enhance color-matching functions. By further optimizing the NW growth as well as the substrate preparation to increase the gold disk size, such as increasing the hole size, SiO 2 thickness, and/or Au thickness, large diameter NWs with increased Sb composition can be obtained to further extend the NW array spectral response to longer wavelength.…”
mentioning
confidence: 93%
“…[1][2][3][4] The current state-of-the-art commercial infrared photodetectors (mainly at 1310 and 1550 nm) are based primarily on some non-silicon materials with narrow bandgaps such as Ge (0.7-1.8 μm), InGaAs (1.1-1.7 μm), and InAs(0.9-3.5 μm). [5,6] However, these non-silicon-based photodetectors have a high cost and in particular, are incompatible with the silicon-based complementary metal-oxide-semiconductor (CMOS) process, making them prohibitively expensive to produce and limiting their use in silicon-based optoelectronic integration. Silicon is the most cost-effective semiconductor material, however, due to its bandgap (1.12 eV) constraint, it has no photon response to infrared light with a wavelength greater than 1100 nm.…”
Section: Introductionmentioning
confidence: 99%