Reflection enhancement of aluminum strips by EB-PVD in highly productive industrial lines

Reinhold, E.; Richter, Jessica; Waydbrink, H; Zschieschang, Erwin

doi:10.1016/s0040-6090(00)01379-1

Cited by 8 publications

(2 citation statements)

References 1 publication

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“…4) Therefore, the vapor quenching method has excellent potential to the industrial application of the bulky sheet materials. Recently, Sasaki et al reported that the vapor quenched binary aluminum alloy sheets with additions of Ni, 5) Ti 6) or Fe, 7,8) Zr or Cr 9) have ultra fine grain and excellent mechanical properties.…”

Section: Introductionmentioning

confidence: 99%

Nanocrystalline structure and Mechanical Properties of Vapor Quenched Al-Zr-Fe Alloy Sheets Prepared by Electron-Beam Deposition

Sasaki¹,

Kobayashi²,

Kita³

et al. 2003

Mater. Trans.

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Nanocrystalline Al-based ternary alloys with additions of Zr and Fe have been prepared by electron-beam deposition. The composition dependence of microstructures and mechanical properties has been investigated. Fine -Al grains are observed and the grain size significantly decreases with the increase of Zr content. Al 95:3 -Zr 4:0 -Fe 0:7 and Al 96:5 -Zr 2:8 -Fe 0:7 alloys consist of -Al containing the coherent meta-stable L1 2 precipitate. The addition of Fe, effectively refined the grain structure, increases hardness and improves the thermal stability of the meta-stable L1 2 -Al 3 Zr phase. Al 95:3 -Zr 4:0 -Fe 0:7 alloy exhibits remarkably high tensile strength both at room temperature and above 523 K, 817 MPa at room temperature, 536 MPa at 523 K and 434 MPa at 573 K, respectively. The microstructure of Al 95:3 -Zr 4:0 -Fe 0:7 alloy exhibits excellent thermal stability under prolonged annealing at 523 K.

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Section: Introductionmentioning

confidence: 99%

Nanocrystalline structure and Mechanical Properties of Vapor Quenched Al-Zr-Fe Alloy Sheets Prepared by Electron-Beam Deposition

Sasaki¹,

Kobayashi²,

Kita³

et al. 2003

Mater. Trans.

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“…Das Elektronenstrahl-Aufdampfen (EB-PVD: Electron Beam Physical Vapor Deposition) ist als langzeitstabiles Hochrateverfahren industriell seit mehr als 20 Jahren eingeführt. Mit diesem Hochvakuumbeschichtungsverfahren wurden großflächig bisher vor allem Metallbänder in sogenannten Air-to-Air-Beschichtungsanlagen [5], Kunststoff-folien in sogenannten Roll-to-Roll-Coatern [6] und…”

Section: Back Side Metallization Of Wafer Based Silicon Solar Cells Bunclassified

Rückseitenmetallisierung Wafer‐basierter Si‐Solarzellen mittels EB‐PVD

Reinhold¹,

Faber²,

Otto³

2011

Vak Forsch Prax

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Mit dem Elektronenstrahlverdampfen ist eine neuartige Beschichtungstechnologie für die Rückseitenmetallisierung von Wafer‐basierten Si‐Solarzellen ins Blickfeld gekommen. Die Motivation ergibt sich aus dem Kostendruck im Wettbewerb mit der Dünnschicht‐Photovoltaik und dem Kosteneinsparpotenzial durch Anwendung des Elektronenstrahlverdampfens. Der Beitrag stellt ein hochproduktives Anlagenkonzept näher vor und geht darauf ein, unter welchen Gesichtspunkten eine Anlagenkonzeptanpassung an die jeweils besonderen Solarzellen‐typischen Merkmale erforderlich ist. Außerdem werden verschiedene PVD‐Technologien hinsichtlich ihres Einsatzpotenzials für die Wafer‐Rückseitenmetallisierung miteinander verglichen. Herausforderungen bei der Einführung der Elektronenstrahl‐Verdampfungstechnologie und besondere Chancen, die ihr Einsatz eröffnet, werden betrachtet.

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Dual‐backlight unit based on a single light source integrated with a beam splitting reflector

Park

Lee

2009

Micro & Optical Tech Letters

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A dual‐backlight unit incorporating a single light source integrated with a beam splitting reflector was demonstrated, providing a surface light beam for both the keypad and display section simultaneously. The reflector was realized by aligning a groove substrate with a matching cover, and a light guiding module comprising a stack of light guide panels and prism/diffuser sheets was attached to both sides of the reflector. A light emanating from the light source—placed in the middle of the substrate—undergoes a series of reflections through the reflector to reach the input of the light guiding module. Then it is transformed into a surface light beam, which is used to irradiate the keypad and display sections. As for the accomplished dual‐backlight unit, the measured average luminance and the spatial luminance uniformity were respectively about 420 cd/m2 and 70% for the keypad section, and 640 cd/m2 and 80% for the display section. © 2009 Wiley Periodicals, Inc. Microwave Opt Technol Lett 51: 1257–1260, 2009; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/mop.24297

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Reflection enhancement of aluminum strips by EB-PVD in highly productive industrial lines

Cited by 8 publications

References 1 publication

Nanocrystalline structure and Mechanical Properties of Vapor Quenched Al-Zr-Fe Alloy Sheets Prepared by Electron-Beam Deposition

Nanocrystalline structure and Mechanical Properties of Vapor Quenched Al-Zr-Fe Alloy Sheets Prepared by Electron-Beam Deposition

Rückseitenmetallisierung Wafer‐basierter Si‐Solarzellen mittels EB‐PVD

Dual‐backlight unit based on a single light source integrated with a beam splitting reflector

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