“…Clumping was not observed in the 35 μm samples. In order to prevent clumping of the 230 μm microspheres during deposition, pure oxygen was periodically introduced via needle valve into the chamber (similar to [22]). Specifically, plasma deposition was stopped, the 1 mTorr argon atmosphere in the chamber was replaced with 5 mTorr of oxygen, the sample was held in the oxygen atmosphere for approximately 2 min, the oxygen was replaced with 1 mTorr argon, and sputtering resumed.…”