Schottky diode properties of semitransparent Ag(4 nm)/Au(4 nm) metal stack on In 0.2 Ga 0.8 N were investigated and defect characterization was performed using capacitance deep level transient (DLTS) and optical spectroscopy (DLOS). DLTS measurements made on the In 0.2 Ga 0.8 N Schottky diodes, which displayed a barrier height of 0.66 eV, revealed the presence of two deep levels located at Ec-0.39 eV and Ec-0.89 eV with nearly identical concentrations of $1.2 Â 10 15 cm À3. Three deeper defect levels were observed by DLOS at Ec-1.45 eV, Ec-1.76 eV, and Ec-2.50 eV with concentrations of 1.3 Â 10 15 cm À3 , 3.2 Â 10 15 cm À3 , and 6.1 Â 10 16 cm À3 , respectively. The latter, with its high trap concentration and energy position lying 0.4 eV above the valance band, suggests a possible role in compensation of carrier concentration, whereas the mid-gap positions of the other two levels imply that they will be important recombination-generation centers V C 2011 American Institute of Physics.