2009
DOI: 10.1016/j.mee.2008.11.008
|View full text |Cite
|
Sign up to set email alerts
|

Qualitative and quantitative characterization of outgassing from SU-8

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1

Citation Types

0
12
0

Year Published

2010
2010
2024
2024

Publication Types

Select...
6

Relationship

0
6

Authors

Journals

citations
Cited by 12 publications
(12 citation statements)
references
References 7 publications
(9 reference statements)
0
12
0
Order By: Relevance
“…However, photoresist materials can generate gas upon 66 annealing for long time periods or during high-power sputter 67 deposition. For example, the epoxy-based photoresist SU-8 (Nip-68 pon Kayaku Co., Ltd.) generates gas containing 2-propenal, ben-69 zene, propylene carbonate, and diphenyl sulfide during the 70 annealing process [11]. TFMG crystallizes upon absorbing impuri-71 ties from the gas.…”
Section: Abstract 27mentioning
confidence: 99%
“…However, photoresist materials can generate gas upon 66 annealing for long time periods or during high-power sputter 67 deposition. For example, the epoxy-based photoresist SU-8 (Nip-68 pon Kayaku Co., Ltd.) generates gas containing 2-propenal, ben-69 zene, propylene carbonate, and diphenyl sulfide during the 70 annealing process [11]. TFMG crystallizes upon absorbing impuri-71 ties from the gas.…”
Section: Abstract 27mentioning
confidence: 99%
“…Spacecraft outgassing is minimized by careful selection of the materials and by hermetic sealing whenever possible. A bakeout, that is, to treat the material in vacuum or in a controlled atmosphere at temperatures as high as possible, is recommended to accelerate outgassing from materials, thus reducing the content of contaminants before use .…”
Section: Introductionmentioning
confidence: 99%
“…To evaluate outgassing from polymers, GC–MS is most usually preferred . In addition, when dealing with solid samples, all the GC injection requirements are superbly managed using a thermal desorption (TD)/sorption system.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…It exhibits many properties that make it suitable for the microfabrication of particle detectors, such as the ability to be structured in a broad range of thicknesses and with high aspect ratios [2], excellent smoothness [3] and transparency [4] (desirable characteristics for the optical materials used in detectors such as scintillators), a relatively high dielectric strength [5] (desirable in devices making use of high electric fields, such as gaseous ionization detectors), and finally low outgassing [6] (necessary to avoid the pollution of the high vacuum environments in which many detectors work) and radiation tolerance [7]. Here we review several particle detector technologies making use of microstructures obtained by SU-8 processing.…”
mentioning
confidence: 99%