SU-8 as a Material for Microfabricated Particle Physics Detectors

Maoddi, Pietro; Mapelli, A.; Jiguet, Sébastien; Renaud, Philippe

doi:10.3390/mi5030594

Cited by 3 publications

(2 citation statements)

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“…Consequently, it is difficult to remove once crosslinked. Nevertheless, this feature is beneficial to applications where it is not desirable to remove the resist [13,14].…”

Section: Introductionmentioning

confidence: 99%

SU-8 processing improvement and simulating studies for a Micromegas detector fabrication

Sampaio¹,

Marinho²,

Cabruja³

et al. 2021

J. Inst.

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This paper reports the manufacturing methodology to produce an electron multiplier, a Micromegas device, integrated onto a micro-pixel readout anode using a Silicon wafer as a holder. It describes the improvement in the processing of the insulating grid material SU-8 and electrical tests with the device. For the latter purpose, simulations with Garfield++ are carried out to predict the detector response for different gas mixtures. The Micromegas detector sandwich proposed in this work presents a series of problems, which we have addressed and discussed within this paper. The temperature control throughout the processing of SU-8 is extremely important, to be able to develop it. When developing the final SU-8 layer, we have used an extra photoresist, which combined with the SU-8, resulted in a much-improved shape of the Micromegas SU-8 hole-grid. Electrical testes are performed in order to verify the signals produced by a 55Fe radioactive source. A gas gain about 1,3 × 102, using Ar/C2H6 (75/25) mixture, is achieved for the prototype manufactured.

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“…Consequently, it is difficult to remove once crosslinked. Nevertheless, this feature is beneficial to applications where it is not desirable to remove the resist [13,14].…”

Section: Introductionmentioning

confidence: 99%

SU-8 processing improvement and simulating studies for a Micromegas detector fabrication

Sampaio¹,

Marinho²,

Cabruja³

et al. 2021

J. Inst.

View full text Add to dashboard Cite

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“…All these techniques allow to further diversify the shapes that can be produced in SU-8. The third review paper describes emerging particle physics detector technologies making use of SU-8 microstructuring [5]. This may seem extremely specific, but in fact the process developments made for producing such detectors can be directly employed for fabricating microfluidic devices of interest for biology or medical devices.…”

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confidence: 99%

Special Issue: 15 Years of SU8 as MEMS Material

Bertsch

Renaud

2015

Micromachines

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In 1997, the first paper using SU-8 as a material for microfabrication was published [1], demonstrating the interest of this negative photoresist for the near-UV structuration of thick layers and the manufacturing of high aspect-ratio components. SU-8 quickly became a cheap alternative to X-ray LIGA, at least for applications that did not require the extreme aspect ratios and precision that can be achieved with X-ray lithography. The possibility to pattern easily multilevel structures of expanded significantly its range of applications and led to its early adoption by the industry.In the last 15 years, the interest of the MEMS community for SU-8 has never declined. SU-8 has been used for the manufacturing of a wide range of components in all application areas of microtechnology. After 15 years of use of the SU-8 resist, it is time to look back at the road travelled: This special issue of Micromachines is dedicated to SU-8 as MEMS material, and its developments in terms of processes and applications.This special issue presents a total of twelve papers that cover a large spectrum of processes and applications of the SU-8 material and includes papers related to established techniques used for industrial production as well as articles dedicated to innovative processing techniques and new potential application areas of this resist.Three of the papers are review articles, focused on different aspects of SU-8. One in particular focuses on industrial applications of SU-8 in the UV-LIGA process [3] and not only describes the primary use of SU-8 for the production of molds, electroplated microparts and multilevel components, but also addresses the fabrication of functionalized parts using inserts and the integration of diffractive optical elements. Mimotec SA, the company from which this paper originates, has its entire manufacturing chain centered on the SU-8 material and it is of particular interest for all SU-8 users to have an industrial perspective presented in this special issue. Another paper reviews non-standard techniques that can be used for processing : inclined and backside photolithography, drawing lithography, holographic interference lithography, two-photo absorption lithography and moving mask OPEN ACCESS

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