“…Then, a MgSe(4ML)/BeZnTe(6ML) SL n-barrier layer (50 nm), a BeZnTe(1ML)/ZnSeTe(10ML) SL active layer (30 nm), a MgSe(4ML)/BeZnTe(6ML) SL p-barrier layer (9 nm), a MgSe(4ML)/BeZnTe(6ML) SL pcladding layer (600 nm), and finally a ZnTe or ZnSeTe contact layers (30 nm) were sequentially grown at 300 °C. Here, the graded SL was introduced to relax the conduction band hetero barrier in electron injection from the ncladding to the n-barrier layers [11]. In this device, the graded SL was composed of 20-pair MgSe(2ML)/ ZnCdSe(3ML), 18-pair MgSe(2ML)/ZnCdSe(2ML) and 12-pair MgSe(2ML)/ZnCdSe(1ML) SLs from the ncladding layer side.…”