2000
DOI: 10.1016/s0022-3093(99)00943-6
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Properties of hydrogenated amorphous silicon thin film transistors fabricated at 150°C

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Cited by 25 publications
(7 citation statements)
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“…Considering that the magnitude of SS represents the quality about how soon the OFETs turn from off state to on state, a lower value is desirable for fast switching. The SS is determined from the following equation in the subthreshold regime at the transfer characteristic curves: SS=VitalicG(logIitalicD)…”
Section: Resultsmentioning
confidence: 99%
“…Considering that the magnitude of SS represents the quality about how soon the OFETs turn from off state to on state, a lower value is desirable for fast switching. The SS is determined from the following equation in the subthreshold regime at the transfer characteristic curves: SS=VitalicG(logIitalicD)…”
Section: Resultsmentioning
confidence: 99%
“…The applied gate-source voltage and initial threshold voltages are expressed as V initial int and V T,2 , V T,0 , respectively. After the pixel circuit has been operated under voltage-bias stress, both T 2 and T 0 are degrading due to the disordered nature of the amorphous material [1], [17]. Consequently, the degradation causes V T on both T 2 and T 0 .…”
Section: The Charge-transfer Self-compensating Mechanismmentioning
confidence: 99%
“…Thus, many efforts have been made to overcome the temperature and power limitation. However, it is generally known that low temperature a-Si:H film does not show acceptable device stability [9][10][11]. Therefore, we have developed low temperate a-Si:H TFT on stainless steel substrate having improved device stability.…”
Section: Introductionmentioning
confidence: 99%