Preparation and properties of indium oxide films

NOx sensing properties of In2O3 thin films grown by MOCVD

“…Several methods have been used to prepare In 2 O 3 thin films, such as dc and rf sputtering [21][22][23], reactive evaporation [24,25], evaporation of metallic indium and subsequent oxidation [26,27], chemical vapor deposition [28], spray pyrolysis [29,30], sol-gel [16,31] and laser ablation [32]. Metal organic chemical vapor deposition (MOCVD) technique is a new and low cost approach for thin film deposition of indium oxide films, which offers the opportunity to control the stoichiometry and morphology by varying the process parameters.…”

Production and characterization of pure and doped copper ferrite nanoparticles

“…The distribution of cations depends on the method of preparation of these compounds [24][25][26][27][28] as well as the processing parameters therein, such as the thermal history of sample and the composition [29][30][31][32].…”

Photoresponse comparison of indium oxide (In₂O₃) nanomaterials

“…More recently, other defects like oxygen antisites, indium interstitials, oxygen interstitials, and indium vacancies were found to be responsible for PL emission in In 2 O 3 [21]. In general, the various effects listed above provide additional transition paths for carriers through energy states created by the defects [22,23]. Thus, the shift and expansion of the PL spectra may be explained as a modification of surface defect states due to the PVA coating, leading to additional carrier transition paths.…”