Preferential orientation of high permittivity TiO2 deposited on Si wafers by an IBAD technique

Yokota, Katsuhiro; Nakamura, Kazuhiro; Yano, Yoshikazu; Miyashita, Fumiyoshi

doi:10.1016/s0257-8972(02)00310-9

Cited by 11 publications

(9 citation statements)

References 12 publications

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“…The effect of ion energy on the films' texture was also observed in the case of AlN thin films. 18,19 In order to investigate the effect of the flux of the bombardment ions on the texture of Al films, the current density was changed from 3 µA/cm 2 to 48 µA/cm 2 at ion energies of 1 kV, 4 kV, and 8 kV, respectively. Figure 2 shows the rocking curves of the (111) peak of Al films deposited on the IBAD Ti underlayers with 4 kV Ar ϩ bombardment.…”

Section: Texture Analysis Of the Al Filmsmentioning

confidence: 99%

Ion bombardment-induced high orientation of Al/Ti films for surface acoustic wave device applications

Pan

Niu

et al. 2005

Journal of Elec Materi

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Al/Ti films were deposited on 128°Y-X LiNbO 3 substrates by electron-beam (e-beam) deposition. Low-energy Ar ion beam bombardment was employed during the Ti underlayer deposition. Influence of low-energy beam bombardment on the texture of Al/Ti films was investigated by x-ray diffraction (XRD) analysis. It was found that Al films deposited on Ar-ion bombarded Ti underlayers possessed excellent (111) texture. With the textured Al/Ti films, a 2.3-GHz range image-impedance connection surface acoustic wave (SAW) filter was successfully fabricated.

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Section: Texture Analysis Of the Al Filmsmentioning

confidence: 99%

Ion bombardment-induced high orientation of Al/Ti films for surface acoustic wave device applications

Pan

Niu

et al. 2005

Journal of Elec Materi

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“…The versatility of IBAD also allows the deposition of adherent TiO 2 films on a wide range of substrates including polyester (Din et al ., 2000), silicon (Yokota et al ., 2002), and steel (Meinert et al ., 1998). Nevertheless, the combined effect of ion beams with different chemical reactivities and the high deposition temperatures on the surface morphology modulation of the IBAD TiO 2 films has yet been reported.…”

Section: Introductionmentioning

confidence: 99%

“…The use of the IBAD technique to prepare TiO 2 films has attracted much research interest because of its ability to apply different chemical identities of ion beams to modulate the electronic and hence photocatalytic properties of the TiO 2 films (Li et al ., 2000;Yokota et al ., 2002;Takaoka et al ., 2005;Wu et al ., 2005;Hsu et al ., 2007). The versatility of IBAD also allows the deposition of adherent TiO 2 films on a wide range of substrates including polyester (Din et al ., 2000), silicon (Yokota et al ., 2002), and steel (Meinert et al ., 1998). Nevertheless, the combined effect of ion beams with different chemical reactivities and the high deposition temperatures on the surface morphology modulation of the IBAD TiO 2 films has yet been reported.…”

Section: Introductionmentioning

confidence: 99%

Structural Study of Titanium Oxide Films Synthesized by Ion Beam‐Assisted Deposition

et al. 2008

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The application of titanium dioxide (TiO(2)) films as surgical implant coatings for antibiotic attachment depends crucially on their available surface area and thus their surface morphology and crystallinity. Here, we report our fabrication of high Wenzel ratio TiO(2) films targeted to increase the film surface area using the ion beam-assisted deposition (IBAD) technique at high-deposition temperatures (approximately 610 degrees C). The modulation of the films' surface morphology was accomplished by varying the chemical identity of the concurrent ion beams bombarded on the films during the e-beam evaporation process. Atomic force microscopy (AFM) and scanning electron microscopy (SEM) were employed to investigate the surface morphology of the as-deposited films. X-ray diffractometry (XRD) revealed that these nanocrystalline films primarily consist of anatase phase TiO(2). Wenzel ratio, the ratio of the actual surface area to the projected area, of IBAD films prepared with argon, oxygen, and nitrogen ion beams was measured to be 1.52, 1.31 and 1.49, respectively. The effect of the differences in chemical reactivity and ion size of these three type ion beams are discussed to explain the present results.

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“…[1][2][3][4][5][6][7][8][9][10][11] The performance of TiO 2 coating is influenced by its microstructures including crystalline structure. For example, the photocatalytic performance of TiO 2 coating is significantly influenced by its phase structure.…”

Section: Introductionmentioning

confidence: 99%

“…[1][2][3][4][7][8][9][10][11][12][13][14][15][16] Among these methods thermal spraying is characterized as a flexible and efficient process which has been widely used to deposit both metallic and nonmetallic coatings. TiO 2 coatings deposited through flame spraying and plasma spraying consist of rutile phase and a fraction of anatase phase.…”

Section: Introductionmentioning

confidence: 99%

Phase Formation during Deposition of TiO<SUB>2</SUB> Coatings through High Velocity Oxy-Fuel Spraying

Wang

et al. 2006

Mater. Trans.

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The crystalline structure of TiO 2 coating is of significant importance for controlling its property and performance, such as photocatalytic activity. The aim of this study is to examine the phase formation mechanisms during high velocity oxy-fuel (HVOF) spraying of TiO 2 coating. TiO 2 coatings were deposited under different spray conditions using both anatase powder and rutile powder as feedstocks. The results showed that the anatase content in the coatings was increased with the increase of fuel gas flow when using the rutile powder as feedstock. A TiO 2 coating of anatase content up to 35% can be obtained by well-melted particles. The high content of anatase phase possibly resulted from rapid solidification and cooling process of the particles. The anatase content in the TiO 2 coating deposited with an anatase powder in partially melted state reached 55-65%. The coating deposited by well-melted anatase powder contained the same anatase content as that by rutile powder. A model was proposed to explain the phase formation within the coatings deposited through HVOF spraying.

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Preferential orientation of high permittivity TiO2 deposited on Si wafers by an IBAD technique

Cited by 11 publications

References 12 publications

Ion bombardment-induced high orientation of Al/Ti films for surface acoustic wave device applications

Ion bombardment-induced high orientation of Al/Ti films for surface acoustic wave device applications

Structural Study of Titanium Oxide Films Synthesized by Ion Beam‐Assisted Deposition

Phase Formation during Deposition of TiO<SUB>2</SUB> Coatings through High Velocity Oxy-Fuel Spraying

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