Structural Study of Titanium Oxide Films Synthesized by Ion Beam‐Assisted Deposition

Abstract

The application of titanium dioxide (TiO(2)) films as surgical implant coatings for antibiotic attachment depends crucially on their available surface area and thus their surface morphology and crystallinity. Here, we report our fabrication of high Wenzel ratio TiO(2) films targeted to increase the film surface area using the ion beam-assisted deposition (IBAD) technique at high-deposition temperatures (approximately 610 degrees C). The modulation of the films' surface morphology was accomplished by varying the chemical identity of the concurrent ion beams bombarded on the films during the e-beam evaporation process. Atomic force microscopy (AFM) and scanning electron microscopy (SEM) were employed to investigate the surface morphology of the as-deposited films. X-ray diffractometry (XRD) revealed that these nanocrystalline films primarily consist of anatase phase TiO(2). Wenzel ratio, the ratio of the actual surface area to the projected area, of IBAD films prepared with argon, oxygen, and nitrogen ion beams was measured to be 1.52, 1.31 and 1.49, respectively. The effect of the differences in chemical reactivity and ion size of these three type ion beams are discussed to explain the present results.

Effect of Zn doping on the sublimation rate of pentaerythritol tetranitrate using atomic force microscopy

“…During the last decade AFM has been emerged as a useful tool in understanding crystal growth and phase transitions of materials (Agger et al 2006;Wang et al 2008;Weeks et al 2002). Tung et al (1999) used the AFM to study the structure and growth kinetics of TNT and PETN films on various substrates and determined the sublimation rates of TNT film on silica by tapping mode AFM and ellipsometry.…”

Surface nano-modification by ion beam–assisted deposition alters the expression of osteogenic genes in osteoblasts

“…7 Surface morphology and crystal structures of these IBAD-produced surfaces (ZrO 2 and TiO 2 films on different substrates) have been reported previously by transmission microscopy (TEM), atomic force microscopy (AFM), and contact angle measurements. 7–18…”

A new method for titania thin film production

“…These materials are used in dental materials 1 and wide bandgap semiconductor. [2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17] TiO 2 material is used for numerous applications such as photocatalytic reactivity, 3,5 resistive switching, [2][3][4] optoelectronic applications, 9 photoelectrochemical applications, 10 waveguiding, semiconductor, storage capacitor, 12 and, so on. TiO 2 is transparent to visible light with many other interesting properties such as a high refractive index, high dielectric constant, high chemical stability, excellent mechanical durability, and high photocatalytic reactivity.…”

“…TiO 2 is transparent to visible light with many other interesting properties such as a high refractive index, high dielectric constant, high chemical stability, excellent mechanical durability, and high photocatalytic reactivity. [2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17] TiO 2 thin films can be produced by numerous techniques such as ion beam deposition system, 1 atomic layer deposition, 2 liquid phase deposition, 3 plasma-enhanced atomic layer deposition, 4 ionized cluster beam, 6 and sputtering methods. 7,8,11,12 However, the structure and the other properties of TiO 2 thin films depend strongly on the deposition technique and parameters.…”