Potential of E-beam lithography for micro- and nano-optics fabrication on large areas

Zeitner, Uwe D.; Banasch, Michael; Trost, Marcus

doi:10.1117/1.jmm.22.4.041405

Cited by 6 publications

(2 citation statements)

References 16 publications

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“…Another drawback is observed in the size of the waveguides; beyond a certain size, they cannot be further reduced with the chosen manufacturing method. For further size reduction, a switch to a different manufacturing method would be necessary, such as electron beam lithography [33].…”

Section: Samplementioning

confidence: 99%

Spatially Resolved, Real-Time Polarization Measurement Using Artificial Birefringent Metallic Elements

Belle,

Kefer,

Hellmann

2024

Photonics

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Polarization states define a fundamental property in optics. Consequently, polarization state characterization is essential in many areas of both field industrial applications and scientific research. However, a full identification of space-variant Stokes parameters faces great challenges, like multiple power measurements. In this contribution, we present a spatially resolved polarization measurement using artificial birefringent metallic elements, the so-called hollow waveguides. Differently oriented and space-variant hollow waveguide arrays, a stationary analyzer and a CMOS camera form the basis of the experimental setup for one single spatially resolved power measurement. From this power measurement, the Stokes parameters can be calculated in quasi-real-time, with a spatial resolution down to 50 μm in square. The dimensions of the individual hollow waveguides, which are less than or equal to the employed wavelength, determine the spectral range, here in the near infrared around λ = 1550 nm. This method allows for the rapid and compact determination of spatially resolved Stokes parameters, which is experimentally confirmed using defined wave plates, as well as an undefined injection-molded polymer substrate.

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Section: Samplementioning

confidence: 99%

Spatially Resolved, Real-Time Polarization Measurement Using Artificial Birefringent Metallic Elements

Belle,

Kefer,

Hellmann

2024

Photonics

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“…Even with state-of-the-art tools equipped with ultrafast 100 MHz-scale e-beam oscillators and multibeam settings, the fabrication process takes several hours per sample, rendering it inefficient for large-scale production. Recent developments in e-beam writing techniques using variable-shaped beam (VSB) and cell-projection (CP) allow metasurface structures to be written over a 280 mm diameter circle area in 36 hours . Nanoimprint lithography (NIL) is a viable technique for mass-producing metasurface optics or continuous metasurface films using metasurface patterns fabricated using e-beam lithography as molds. ,, A list of recent notable developments in scaling the diameter of metalenses is provided in Table S1.…”

mentioning

confidence: 99%

All-Glass 100 mm Diameter Visible Metalens for Imaging the Cosmos

Park,

Lim,

Amirzhan

et al. 2024

ACS Nano

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Metasurfaces, optics made from subwavelength-scale nanostructures, have been limited to millimeter-sizes by the scaling challenge of producing vast numbers of precisely engineered elements over a large area. In this study, we demonstrate an all-glass 100 mm diameter metasurface lens (metalens) comprising 18.7 billion nanostructures that operates in the visible spectrum with a fast f-number (f/1.5, NA = 0.32) using deep-ultraviolet (DUV) projection lithography. Our work overcomes the exposure area constraints of lithography tools and demonstrates that large metasurfaces are commercially feasible. Additionally, we investigate the impact of various fabrication errors on the imaging quality of the metalens, several of which are specific to such large area metasurfaces. We demonstrate direct astronomical imaging of the Sun, the Moon, and emission nebulae at visible wavelengths and validate the robustness of such metasurfaces under extreme environmental thermal swings for space applications.

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Thermal excitation-induced micro/nano fabrication and material modification of superconducting Nb films

Shi,

Zhang,

Zhou

et al. 2024

Applied Physics Letters

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We report the thermal excitation-induced material modification and micro/nano fabrication based on the interactions between nano laser direct writing (NLDW) and superconducting films experimentally and by simulation. The niobium (Nb) films with a critical temperature of 9 K were deposited on silicon substrate via sputtering with the thickness of around 50 nm. The boundary between material modification and micro/nano fabrication was verified by changing the interaction time and laser power continuously. Specifically, as the laser power was fixed at 250 mW and the interaction time below 440 ns, the interaction is material modification. With the increasing interaction time further, the Nb films were etched away. As the interaction time was fixed at 500 ns and the laser power below 200 mW, the interaction is material modification too. With the increasing of laser power further, the Nb films were etched away. In the experiment, the oxygen content and current–voltage characteristic (IVCs) before and after laser irradiation were displayed to verify the material modification, which is in line with the simulation results. Considering the 50 nm resolution of NLDW, in the material modification region, one could trim trilayer junctions, tune shunt resistors, or adjust critical currents, etc. In the micro/nano fabrication region, one could fabricate various devices and exploit the properties of high spatial resolution, high flexibility, and fast processing.

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Potential of E-beam lithography for micro- and nano-optics fabrication on large areas

Cited by 6 publications

References 16 publications

Spatially Resolved, Real-Time Polarization Measurement Using Artificial Birefringent Metallic Elements

Spatially Resolved, Real-Time Polarization Measurement Using Artificial Birefringent Metallic Elements

All-Glass 100 mm Diameter Visible Metalens for Imaging the Cosmos

Thermal excitation-induced micro/nano fabrication and material modification of superconducting Nb films

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