A spherical artificial compound eye which is comprised of an imaging microlens array and a pinhole array in the focal plane serving as receptor matrix is fabricated. The arrays are patterned on separate spherical bulk lenses by means of a special modified laser lithography system which is capable of generating structures with low shape deviation on curved surfaces. Design considerations of the imaging system are presented as well as the characterization of the comprising elements on curved surfaces, with special attention on the homogeneity over the array. The assembled system is the first spherical compound eye able to capture images. It is evaluated by analyzing resolution and cross-talk between the single channels.

Gratings are essential components in different high performance optical set-ups such as spectrometers in space missions or ultrashort-pulse laser compression arrangements. Often such kinds of applications require gratings operating close to the technological accessible limits of today's fabrication technology. Typical critical parameters are the diffraction efficiency and its polarization dependency, the wave-front error introduced by the grating, and the stray-light performance. Additionally, space applications have specific environmental requirements and laser application typically demand a high damage threshold. All these properties need to be controlled precisely on rather large grating areas. Grating sizes of 200 mm or even above are not unusual anymore. The paper provides a review on how such high performance gratings can be realized by electron-beam lithography and accompanying technologies. The approaches are demonstrated by different examples. The first example is the design and fabrication of the grating for the Radial-Velocity-Spectrometer of the GAIA-mission of the ESA. The second grating is a reflective pulse compression element with no wavelength resonances due to an optimized design. The last example shows a three level blazed grating in resonance domain with a diffraction efficiency of approximately 86 %

In application of ultra-short laser pulses the pulse parameters have to be controlled accurately. Hence the manipulation of the propagation behavior of ultra-short pulses requires for specially designed optics. We have developed a tool for the simulation of ultra-short laser pulse propagation through complex real optical systems based on a combination of ray-tracing and wave optical propagation methods. For the practical implementation of the approach two commercially available software packages have been linked together, which are ZEMAX and Virtual Optics Lab. The focussing properties of different lenses will be analyzed and the results are demonstrated.

A new illumination system for mask aligner lithography is presented. The illumination system uses two subsequent microlens-based Köhler integrators. The second Köhler integrator is located in the Fourier plane of the first. The new illumination system uncouples the illumination light from the light source and provides excellent uniformity of the light irradiance and the angular spectrum. Spatial filtering allows to freely shape the angular spectrum to minimize diffraction effects in contact and proximity lithography. Telecentric illumination and ability to precisely control the illumination light allows to introduce resolution enhancement technologies (RET) like customized illumination, optical proximity correction (OPC) and source-mask optimization (SMO) in mask aligner lithography.