Proceedings of the 47th Design Automation Conference 2010
DOI: 10.1145/1837274.1837344
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Post-silicon diagnosis of segments of failing speedpaths due to manufacturing variations

Abstract: We study diagnosis of segments on speedpaths that fail the timing constraint at the post-silicon stage due to manufacturing variations. We propose a formal procedure that is applied after isolating the failing speedpaths which also incorporates post-silicon path-delay measurements for more accurate analysis. Our goal is to identify segments of the failing speedpaths that have a post-silicon delay larger than their estimated delays at the pre-silicon stage. We refer to such segments as "failing segments" and we… Show more

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Cited by 22 publications
(6 citation statements)
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References 11 publications
(23 reference statements)
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“…SSTA methods analyze a circuit considering timing variations. The work in [3] proposes a formal procedure based on an integer linear programming (ILP) formulation to diagnose segments of failing speedpaths due to process variations. ILP is a specific case of a system of linear constraints in which the variables can only take integer values.…”
mentioning
confidence: 99%
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“…SSTA methods analyze a circuit considering timing variations. The work in [3] proposes a formal procedure based on an integer linear programming (ILP) formulation to diagnose segments of failing speedpaths due to process variations. ILP is a specific case of a system of linear constraints in which the variables can only take integer values.…”
mentioning
confidence: 99%
“…A speedpath is a frequency-limiting critical path which affects the performance of a chip [2]. A speedpath that violates timing constraints at the post-silicon stage is called failing speedpath [3]. Speedpaths fail due to, e.g., timing variations induced by process, design, and environmental effects [2].…”
mentioning
confidence: 99%
“…Electronic Beam Lithography (EBL) is a maskless technique, which shoots desired patterns directly into a silicon wafer, and can potentially combat device parameter variations [13][14][15]. Various investigation [9][10][11][12] have been conducted on the optimization of character selection for EPL technology, where no intersection is allowed between templates on the stencil, as shown by Fig.…”
Section: Overlapped Charactermentioning
confidence: 99%
“…Such methods measurably sensitize a path. Approaches in [6] [7] rely on specially fabricated paths which are assumed to be defect free, and [6] measured delays along them for post-silicon diagnosis of segment defects. However, such assumptions may not always hold.…”
Section: Introductionmentioning
confidence: 99%