2011
DOI: 10.1179/174329409x433858
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Plasma polymerisation of siloxanes at atmospheric pressure

Abstract: This work deals with the plasma polymerisation of two siloxane precursors, [hexamethyldisiloxane (HMDSO) and tetramethyldisiloxane (TMDSO)] with an atmospheric pressure pseudoglow dielectric barrier discharge operated in argon and an argon-air mixture. The influence of gas composition and precursor type on the physical and chemical properties of the deposited films is examined in detail using contact angle measurements, Fourier transform infrared spectroscopy (FTIR) and atomic force microscopy (AFM). Results c… Show more

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Cited by 9 publications
(11 citation statements)
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“…eV for the C-O bond and 288.9 eV for the O-C=O bond [17,36]. A general presentation of this curve fit on commercial PMMA can be found in Fig 5 (down) and is similar to the C1s curve fit of plasma polymerised PMMA (same binding energies, different ratios).…”
Section: Xps Analysissupporting
confidence: 62%
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“…eV for the C-O bond and 288.9 eV for the O-C=O bond [17,36]. A general presentation of this curve fit on commercial PMMA can be found in Fig 5 (down) and is similar to the C1s curve fit of plasma polymerised PMMA (same binding energies, different ratios).…”
Section: Xps Analysissupporting
confidence: 62%
“…The results depicted in influence on the deposition rate [17]. When analysing the growth rate in function of this parameter, 3 regimes can be distinguished.…”
Section: Optical Reflectance Spectroscopymentioning
confidence: 92%
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