“…Titanium dioxide (TiO 2 ) has attracted much attention in recent years due to its great potential for applications in optical elements, electrical insulation, capacitors or gates in microelectronic devices, photovoltaic solar cells, anti reflection coatings, optical waveguides, photonic crystals, devices based on metal etc [6]. Many deposition methods have been used to prepare TiO 2 thin films, such as electron-beam evaporation [7], ion-beam assisted deposition [8], DC reactive magnetron sputtering [9], RF reactive magnetron sputtering [10], sol-gel dip coating method [11], sol-gel spin coating method [12], chemical vapor deposition [13], plasma enhanced chemical vapor deposition [14] and pulsed laser deposition (PLD) [15]. Among these methods, PLD technique has been widely used for growing oxide films because it allows for stoichiometry of the synthesized material.…”