2008
DOI: 10.1016/j.jnoncrysol.2007.01.108
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Photocatalytic TiO2 films prepared by chemical vapor deposition at atmosphere pressure

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Cited by 91 publications
(38 citation statements)
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“…Titanium dioxide (TiO 2 ) has attracted much attention in recent years due to its great potential for applications in optical elements, electrical insulation, capacitors or gates in microelectronic devices, photovoltaic solar cells, anti reflection coatings, optical waveguides, photonic crystals, devices based on metal etc [6]. Many deposition methods have been used to prepare TiO 2 thin films, such as electron-beam evaporation [7], ion-beam assisted deposition [8], DC reactive magnetron sputtering [9], RF reactive magnetron sputtering [10], sol-gel dip coating method [11], sol-gel spin coating method [12], chemical vapor deposition [13], plasma enhanced chemical vapor deposition [14] and pulsed laser deposition (PLD) [15]. Among these methods, PLD technique has been widely used for growing oxide films because it allows for stoichiometry of the synthesized material.…”
Section: Introductionmentioning
confidence: 99%
“…Titanium dioxide (TiO 2 ) has attracted much attention in recent years due to its great potential for applications in optical elements, electrical insulation, capacitors or gates in microelectronic devices, photovoltaic solar cells, anti reflection coatings, optical waveguides, photonic crystals, devices based on metal etc [6]. Many deposition methods have been used to prepare TiO 2 thin films, such as electron-beam evaporation [7], ion-beam assisted deposition [8], DC reactive magnetron sputtering [9], RF reactive magnetron sputtering [10], sol-gel dip coating method [11], sol-gel spin coating method [12], chemical vapor deposition [13], plasma enhanced chemical vapor deposition [14] and pulsed laser deposition (PLD) [15]. Among these methods, PLD technique has been widely used for growing oxide films because it allows for stoichiometry of the synthesized material.…”
Section: Introductionmentioning
confidence: 99%
“…In general, spray pyrolysis is an attractive processing technique owing to a number of advantages: (1) low operational costs, (2) simple facilities, (3) ambient operation, [24][25][26][27] (4) potential for mass production, 20 (5) reproducibility of films, (6) rapid film growth rates (up to 100 nm/s 28 ), and (7) large surface area coverage. [20][21][22][23] Despite its advantages, spray pyrolysis has been the subject of only two types of mechanistic modeling studies [29][30][31][32] and two reviews.…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, 3D structure TiO 2 became a focus of current research. A large number of 3D urchin-like TiO 2 nanostructures have been synthesized through hydrothermal synthesis [2,11], vapor deposition [12], self-assembly [13], and template-sacrificial techniques [14]. Some studies also show that the performance of the urchin-like structure is superior to lowdimensional nanomaterials [15e17].…”
Section: Introductionmentioning
confidence: 99%