Photoacid and photobase generators: Chemistry and applications to polymeric materials

Shirai, Masamitsu; Tsunooka, Masahiro

doi:10.1016/0079-6700(95)00014-3

Cited by 195 publications

(56 citation statements)

References 86 publications

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“…One way to get more chemical conversion per absorbed photon is to use chemical amplification mechanisms such as in acid-sensitive resists. 2 However, the photoacid generators and their quenchers are randomly distributed, causing further stochastic effects. 3 Quenchers, in particular, are known to have a large contribution to stochastic noise, as a result of their low concentration in the photosensitive layer.…”

Section: Introductionmentioning

confidence: 99%

Extreme ultraviolet patterning of tin-oxo cages

Haitjema

Vockenhuber

Kazazis

et al. 2017

J. Micro/Nanolith. MEMS MOEMS

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Abstract. We report on the extreme ultraviolet (EUV) patterning performance of tin-oxo cages. These cage molecules were already known to function as a negative tone photoresist for EUV radiation, but in this work, we significantly optimized their performance. Our results show that sensitivity and resolution are only meaningful photoresist parameters if the process conditions are optimized. We focus on contrast curves of the materials using large area EUV exposures and patterning of the cages using EUV interference lithography. It is shown that baking steps, such as postexposure baking, can significantly affect both the sensitivity and contrast in the open-frame experiments as well as the patterning experiments. A layer thickness increase reduced the necessary dose to induce a solubility change but decreased the patterning quality. The patterning experiments were affected by minor changes in processing conditions such as an increased rinsing time. In addition, we show that the anions of the cage can influence the sensitivity and quality of the patterning, probably through their effect on physical properties of the materials.

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Section: Introductionmentioning

confidence: 99%

Extreme ultraviolet patterning of tin-oxo cages

Haitjema

Vockenhuber

Kazazis

et al. 2017

J. Micro/Nanolith. MEMS MOEMS

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“…A variety of DPs and acid generators suitable for this type of memory material exist [8][9][10][11]. However, to be suitable for use with two-photon 3D memory devices, these molecules must possess the following characteristics: -The photoprocesses that generate the acid must have a high quantum efficiency.…”

Section: Media Based On Fluorophores Activated By Photo Generatorsmentioning

confidence: 99%

“…R = 4-hydroxy-3-coumarinyl; R 1 = C 6 H 4 -OMe; R 2 = Ph 12: R = R 1 = R 2 Electronic absorption spectra of pyrazoline 11 (c = 48 μm) and rhodamine B lactone form (c = 50 μm) in CCl 4 before (1) and after(2)(3)(4)(5)(6)(7)(8)(9)(10)(11) irradiation at 420 nm. Electronic absorption (1, 2) and emission spectra (3) of PMMA film with dissolved pyrazoline 11, rhodamine B lactone form, and C 2 Cl 6 before (1) and after(2,3) irradiation at 420 nm.…”

mentioning

confidence: 99%

Media with photoinduced irreversible fluorescence

Traven

Cheptsov

2015

Heterocyclic Communications

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The development of light-sensitive media based on organic, mostly heterocyclic compounds that have no fluorescence in their initial form but provide fluorescent photoproducts formation is considered in this review. Materials with photoinduced irreversible fluorescence appear to be the most promising in the design of recording media for 3D archive optical memory. Photoactivatable fluorophores are also of interest for use in cell biology.

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“…In these systems, photo-active curing agents (PAs) were used as latent curing agents and various epoxies were used as thermo setting polymers. [1,2] Ultra low temperature curable ACFs with photo-active curing agents (PA-ACFs) based on these crosslinking systems and contained thermoplastic polymer resin for film-formability. Au coated Ni particles were used as conductive particles.…”

Section: Introductionmentioning

confidence: 99%

Low temperature curable anisotropic conductive films (ACFs) with photo-active curing agent (PA-ACFs)

Kim

Paik

2012

2012 IEEE 62nd Electronic Components and Technology Conference

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Ultra low temperature curable anisotropic conductive films with photo-active curing agent (PA-ACFs) have been newly developed with crosslinking systems using photoactive curing agents. PA-ACFs cannot be cured at temperature higher than 100 °C before the UV activation, and the crosslinking systems do not work in fluorescent light. However, after the UV activation, PA-ACFs can be cured at 100 °C within 15 seconds. Flex.-on-board (FOB) assembly using PA-ACFs showed the similar adhesion strength and joint resistances than those of the FOB assembly using conventional ACFs.

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Photoacid and photobase generators: Chemistry and applications to polymeric materials

Cited by 195 publications

References 86 publications

Extreme ultraviolet patterning of tin-oxo cages

Extreme ultraviolet patterning of tin-oxo cages

Media with photoinduced irreversible fluorescence

Low temperature curable anisotropic conductive films (ACFs) with photo-active curing agent (PA-ACFs)

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