1993
DOI: 10.1103/physrevb.47.4111
|View full text |Cite
|
Sign up to set email alerts
|

Phosphorus antisite defects in low-temperature InP

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1

Citation Types

5
16
0

Year Published

2000
2000
2017
2017

Publication Types

Select...
5
3

Relationship

1
7

Authors

Journals

citations
Cited by 65 publications
(21 citation statements)
references
References 11 publications
5
16
0
Order By: Relevance
“…[39,40] Such a low carrier concentration not only confirms that there are fewer native defects in our InP NWs but also indicates that they could potentially be beneficial in optoelectronic applications.…”
Section: à3supporting
confidence: 61%
“…[39,40] Such a low carrier concentration not only confirms that there are fewer native defects in our InP NWs but also indicates that they could potentially be beneficial in optoelectronic applications.…”
Section: à3supporting
confidence: 61%
“…16,18 The native P In donor level was indicated to be about 0.2-0.3 eV below the conduction band, 17,31 and the acceptor level due to Bi pairs/clusters was found at about 0.11 eV above the valence band in InP 0.975 Bi 0.025 . 17 In addition, theoretical simulations suggested that the Bi In anti-site exists in InPBi and the energetic level is located at about 0.39 eV below the conduction band of InPBi at RT.…”
Section: Tmentioning
confidence: 97%
“…Low-temperature growth introduces unavoidably highdensity donor-type impurities 31 and leads to the n-type characteristics of InPBi. 32 The Fermi level is hence close to the conduction band, and the Bi pairs/clusters-induced acceptor levels are filled by electrons in the steady state.…”
mentioning
confidence: 99%
“…Optimal growth conditions were then used for the growth of a 33 nm thick InGaAs capping layer. More precisely, GID in low temperature grown InP are related to a P-rich stoichiometry with a large quantity of P In antisite defects, 19,20 which upon annealing result in an excess of P interstitials that promote interdiffusion. 21,22 The samples used for the experiments on vacancy trapping in compressively strained QWs are shown schematically in Figs.…”
Section: Methodsmentioning
confidence: 99%