2020
DOI: 10.1016/j.microrel.2020.113644
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Performance of SiC cascode JFETs under single and repetitive avalanche pulses

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Cited by 5 publications
(3 citation statements)
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References 28 publications
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“…1.2 Drift layer thickness (µm) 6.0 Drift layer doping (cm -3 ) 2.33x10 16 Drain doping (cm -3 ) 1x10 19 Channel doping (cm -3 ) 2.33x10 16 JFET gate doping (cm -3 ) 1x10 19 Cell pitch (µm) 3.2 Area factor (µm) 6x10 5 Breakdown (V) 800…”
Section: Parametermentioning
confidence: 99%
See 1 more Smart Citation
“…1.2 Drift layer thickness (µm) 6.0 Drift layer doping (cm -3 ) 2.33x10 16 Drain doping (cm -3 ) 1x10 19 Channel doping (cm -3 ) 2.33x10 16 JFET gate doping (cm -3 ) 1x10 19 Cell pitch (µm) 3.2 Area factor (µm) 6x10 5 Breakdown (V) 800…”
Section: Parametermentioning
confidence: 99%
“…In SiC Cascode JFETs, since a LV silicon MOSFET is used, the failure mode is different. For example, considering unclamped inductive switching (UIS), previous studies indicated the key role of the gate leakage current of the JFET during UIS conditions [18][19][20]. This paper aims to investigate the failure modes of SiC Cascode JFETs during SC conditions.…”
Section: Introductionmentioning
confidence: 99%
“…These negative values indicate that the rated voltage of the SiC JFET is exceeded, which must be avoided. Even modest violations of the semiconductor voltage rating can compromise device lifetime if repetitive switching occurs under these conditions [34], [35].…”
Section: B Normalized Voltage Marginmentioning
confidence: 99%