2006
DOI: 10.1177/0954008305055012
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Pendent Polyimides using Mellitic Acid Dianhydride. I. An Atomic Oxygen-resistant, Pendent 4,4′-ODA/PMDA/MADA Co-polyimide Containing Zirconium

Abstract: The goal of this research is to increase the metal-organic concentration in Kapton-like polyimides (PIs) to achieve increased atomic oxygen (AO) resistance while retaining desirable film properties. Co-polyamic acid (PAA) precursors were prepared using a novel polymer building block, mellitic acid dianhydride (MADA), to provide sites for pendent group attachment. Attachment of an amino group-functionalized zirconium complex to the co-PAA precursors was facilitated by a stoichiometric amount of dicyclohexylcarb… Show more

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Cited by 24 publications
(33 citation statements)
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“…However, a significant decrease in film quality was observed even at relatively low additive concentrations. To address this limitation, the structures of the PAAs52–54 and of one of the additives49 were modified so that they could be covalently attached, i.e., the metal‐organic additive would now be a pendent group. As a result, substantial increases in the metal‐organic mole percentage became possible (up to 50 mole percent) while retaining good film quality 52.…”
Section: Introductionmentioning
confidence: 99%
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“…However, a significant decrease in film quality was observed even at relatively low additive concentrations. To address this limitation, the structures of the PAAs52–54 and of one of the additives49 were modified so that they could be covalently attached, i.e., the metal‐organic additive would now be a pendent group. As a result, substantial increases in the metal‐organic mole percentage became possible (up to 50 mole percent) while retaining good film quality 52.…”
Section: Introductionmentioning
confidence: 99%
“…All starting materials and solvents were obtained from sources, handled, and purified as described previously 52–54. MADA was prepared and its purity established by thermogravimetric analysis (TGA) as reported previously 54.…”
Section: Introductionmentioning
confidence: 99%
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