2016
DOI: 10.1088/1757-899x/108/1/012030
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Oxygen adsorption at noble metal/TiO2junctions

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Cited by 10 publications
(7 citation statements)
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“…This result is consistent with the reported independence of the height of the junction barrier formed on TiO 2 by various metals . For Au/TiO 2 , however, these numerical values lead to a barrier height approximately around 0.4 eV . A much higher barrier value in our case indicates a complex junction nature.…”
Section: Resultssupporting
confidence: 92%
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“…This result is consistent with the reported independence of the height of the junction barrier formed on TiO 2 by various metals . For Au/TiO 2 , however, these numerical values lead to a barrier height approximately around 0.4 eV . A much higher barrier value in our case indicates a complex junction nature.…”
Section: Resultssupporting
confidence: 92%
“…The nonlinearity is expected to stem from the Au/TiO 2 junction, which has been reported earlier by Chakrabartty et al and Karaagac et al However, Figure a shows that S0 (seed layer) exhibits almost symmetric and linear J d – V characteristics, indicating an almost zero junction barrier height. The linear and symmetric behavior observed in the J – V characteristics around V = 0 originates from the trap-populated TiO 2 surface layer adjacent to the interface, as observed by others . It has been shown previously that a high V O concentration can break the interface barrier in M/TiO 2 junctions .…”
Section: Resultssupporting
confidence: 77%
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“…Moreover, it has been reported that Schottky type contact is essential on TiO 2 to enable resistive switching [15], making the study of the interface effects of particular interest also for memristor based application. In turn, the properties of Metal/TiO 2 interfaces are intensively studied by several groups over the recent years [16]- [22].…”
Section: Introductionmentioning
confidence: 99%
“…In contrast to the conventional semiconducting materials, this well-defined theory cannot directly be applied on Metal/TiO 2 interfaces. Experimental results demonstrated that this is not a traditional Schottky barrier and rather than the metal work function, it is the metal electronegativity [16], the interface reaction [18], [19], or even the design and/or fabrication details [20]- [22] that could determine the interface properties, although further investigations are still required towards thorough clarification. A common approach on the aforementioned studies is the implementation of distinct metal contacts formed at the top of the TiO 2 films and are benchmarked via the room temperature assessment of their current-voltage characteristic.…”
Section: Introductionmentioning
confidence: 99%