Optical transmittance and photoconductivity studies on ZnO:Al thin films prepared by the sol–gel technique

González, Agustı́n E.; Urueta, Jose A. Soto

doi:10.1016/s0927-0248(97)00243-2

Cited by 58 publications

(17 citation statements)

References 6 publications

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“…It is also much lower than the 90% -95% transmittance in the UV-VIS-NIR regions for ZnO thin films deposited using spray pyrolysis method [44,45] and SolGel method [46].…”

Section: Resultsmentioning

confidence: 82%

Effect of Concentration on the Optical and Solid State Properties of ZnO Thin Films Deposited by Aqueous Chemical Growth (ACG) Method

Mammah¹,

Opara²,

Sigalo³

et al. 2012

JMP

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Thin films of Zinc Oxide (ZnO) having different concentrations were deposited using the Aqueous Chemical Growth (ACG) method. The films were characterized using Rutherford Back Scattering (RBS) spectroscopy for chemical composition and thickness, X-Ray Diffraction (XRD) for crystallographic structure, a UV-VIS spectrophotometer for the analysis of the optical and solid state properties which include spectral absorbance, transmittance, reflectance, refractive index, direct band gap, real and imaginary dielectric constants, absorption and extinction coefficients and a photomicroscope for photomicrographs. The average deposited film thickness was 100 nm. The results indicate that the values of all the optical and solid state properties investigated vary directly with concentration except transmittance which is the reverse. Thus, the optical and solid state properties of ZnO thin film deposited by the Aqueous Chemical Growth method can be tuned by deliberately controlling the concentration of the precursors for various optoelectronic applications including its application as absorber layer in solar cells.

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“…It is also much lower than the 90% -95% transmittance in the UV-VIS-NIR regions for ZnO thin films deposited using spray pyrolysis method [44,45] and SolGel method [46].…”

Section: Resultsmentioning

confidence: 82%

Effect of Concentration on the Optical and Solid State Properties of ZnO Thin Films Deposited by Aqueous Chemical Growth (ACG) Method

Mammah¹,

Opara²,

Sigalo³

et al. 2012

JMP

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show abstract

“…The transmittance of the films in the visible region is generally lower than the above 85% transmittance reported using Chemical Bath Deposition method [43]. It is also much lower than the 90% 95% transmittance in the UV-VIS-NIR regions for ZnO thin films deposited using spray pyrolysis method [44,45] and Sol Gel method [46].…”

Section: Resultsmentioning

confidence: 88%

Effect of Concentration on the Optical and Solid State Properties of ZnO Thin Films Deposited by Aqueous Chemical Growth (ACG) Method

Mammah¹,

Opara²,

Sigalo³

et al. 2012

JMP

View full text Add to dashboard Cite

Thin films of Zinc Oxide (ZnO) having different concentrations were deposited using the Aqueous Chemical Growth (ACG) method. The films were characterized using Rutherford Back Scattering (RBS) spectroscopy for chemical composition and thickness, X-Ray Diffraction (XRD) for crystallographic structure, a UV-VIS spectrophotometer for the analysis of the optical and solid state properties which include spectral absorbance, transmittance, reflectance, refractive index, direct band gap, real and imaginary dielectric constants, absorption and extinction coefficients and a photomicroscope for photomicrographs. The average deposited film thickness was 100 nm. The results indicate that the values of all the optical and solid state properties investigated vary directly with concentration except transmittance which is the reverse. Thus, the optical and solid state properties of ZnO thin film deposited by the Acqueous Chemical Growth method can be tuned by deliberately controlling the concentration of the precursors for various optoelectronic applications including its application as absorber layer in solar cells.

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“…There are two reasons for this trend: ͑i͒ the electronegativity difference between aluminum ͑1.61͒ and zinc ͑1.65͒ is very small and ͑ii͒ the ionic radii of Al ͑53.0 and 67.5 pm͒ are slightly smaller than the ionic radii of zinc ͑60 and 71 pm͒ in the ͑IV͒ and ͑VI͒ configurations, respectively. 4 Aluminum-doped ZnO ͑AZO͒ thin films have been grown by a variety of techniques. One technique is the simultaneous evaporation or sputtering of zinc and aluminum sources, which subsequently react in an oxygen atmosphere to produce the films.…”

Section: Introductionmentioning

confidence: 99%

Influence of vacuum annealing on the physical properties of ZnO/Al/ZnO multilayer coatings

Al‐Maghrabi¹,

Al-Kuhaili²,

Durrani³

et al. 2009

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Multilayer ZnO/Al/ZnO coatings were deposited by thermal evaporation on substrates heated to 300 °C. Subsequently, the coatings were annealed in vacuum in the temperature range of 300–600 °C. The structural properties of the films were investigated using x-ray diffraction and atomic force microscopy. The chemical properties were determined from x-ray photoelectron spectroscopy. The electrical and optical properties of the coatings were studied in order to evaluate their performance as transparent conducting coatings. The best performance was obtained with films annealed at 500 °C, for which the average visible transmittance was about 60% and the resistivity was 6.1×10−3 Ω cm.

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Optical transmittance and photoconductivity studies on ZnO:Al thin films prepared by the sol–gel technique

Cited by 58 publications

References 6 publications

Effect of Concentration on the Optical and Solid State Properties of ZnO Thin Films Deposited by Aqueous Chemical Growth (ACG) Method

Effect of Concentration on the Optical and Solid State Properties of ZnO Thin Films Deposited by Aqueous Chemical Growth (ACG) Method

Effect of Concentration on the Optical and Solid State Properties of ZnO Thin Films Deposited by Aqueous Chemical Growth (ACG) Method

Influence of vacuum annealing on the physical properties of ZnO/Al/ZnO multilayer coatings

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