2012
DOI: 10.4236/jmp.2012.310187
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Effect of Concentration on the Optical and Solid State Properties of ZnO Thin Films Deposited by Aqueous Chemical Growth (ACG) Method

Abstract: Thin films of Zinc Oxide (ZnO) having different concentrations were deposited using the Aqueous Chemical Growth (ACG) method. The films were characterized using Rutherford Back Scattering (RBS) spectroscopy for chemical composition and thickness, X-Ray Diffraction (XRD) for crystallographic structure, a UV-VIS spectrophotometer for the analysis of the optical and solid state properties which include spectral absorbance, transmittance, reflectance, refractive index, direct band gap, real and imaginary dielectri… Show more

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Cited by 4 publications
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“…Among TMOs, zinc oxide stands out as the most frequently employed electron transport layer. ZnO is categorized as an n-type semiconductor due to inherent crystalline defects such as oxygen vacancies and interstitial Zn atoms. It boasts a wide direct band gap (approximately 3.37 V at room temperature) and exhibits the capacity to form thin films with high optical transparency and electronic mobility. Furthermore, ZnO thin films exhibit a wide range of work functions, spanning from around 3.0 eV to over 5.0 eV. , The low work function values enable favorable alignment with the work function of transparent conductive oxides (TCOs), typically found in the front electrodes of devices (e.g., approximately 4.4 eV for FTO).…”
Section: Introductionmentioning
confidence: 99%
“…Among TMOs, zinc oxide stands out as the most frequently employed electron transport layer. ZnO is categorized as an n-type semiconductor due to inherent crystalline defects such as oxygen vacancies and interstitial Zn atoms. It boasts a wide direct band gap (approximately 3.37 V at room temperature) and exhibits the capacity to form thin films with high optical transparency and electronic mobility. Furthermore, ZnO thin films exhibit a wide range of work functions, spanning from around 3.0 eV to over 5.0 eV. , The low work function values enable favorable alignment with the work function of transparent conductive oxides (TCOs), typically found in the front electrodes of devices (e.g., approximately 4.4 eV for FTO).…”
Section: Introductionmentioning
confidence: 99%