“…A unique capability of CVD method is that both vertical and horizontally aligned CNTs at predefined substrate locations can be grown (Fig. 5), which allows their direct integration in various applications, for example, interconnects, micro-electrode arrays and optical devices [37,79,91,102,[105][106][107][108][109][110][111]. Selective growth of metallic (m-SWCNTs) or semiconducting (s-SWCNTs) CNTs with controlled diameter, walls, chirality, alignment and density is still challenging.…”