2016
DOI: 10.1038/srep18767
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Optical nanostructures in 2D for wide-diameter and broadband beam collimation

Abstract: Eliminating curved refracting lensing components used in conventional projection, imaging and sensing optical assemblies, is critical to enable compactness and miniaturisation of optical devices. A suitable means is replacing refracting lenses with two-dimensional optical media in flat-slab form, to achieve an equivalent optical result. One approach, which has been the focus of intense research, uses a Veselago lens which features a negative-index metamaterial. However, practical implementations rely on resona… Show more

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Cited by 6 publications
(6 citation statements)
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References 34 publications
(51 reference statements)
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“…A unique capability of CVD method is that both vertical and horizontally aligned CNTs at predefined substrate locations can be grown (Fig. 5), which allows their direct integration in various applications, for example, interconnects, micro-electrode arrays and optical devices [37,79,91,102,[105][106][107][108][109][110][111]. Selective growth of metallic (m-SWCNTs) or semiconducting (s-SWCNTs) CNTs with controlled diameter, walls, chirality, alignment and density is still challenging.…”
Section: Cvd Growth Of Cntsmentioning
confidence: 99%
“…A unique capability of CVD method is that both vertical and horizontally aligned CNTs at predefined substrate locations can be grown (Fig. 5), which allows their direct integration in various applications, for example, interconnects, micro-electrode arrays and optical devices [37,79,91,102,[105][106][107][108][109][110][111]. Selective growth of metallic (m-SWCNTs) or semiconducting (s-SWCNTs) CNTs with controlled diameter, walls, chirality, alignment and density is still challenging.…”
Section: Cvd Growth Of Cntsmentioning
confidence: 99%
“…Combining this low temperature growth method with conducting diffusion barrier layers enables us to fabricate devices onto conductive substrates, which are kept at temperatures (Figure 1b) that are compatible with CMOS manufacturing processes. 17,24,25,32,33…”
Section: Cnt Synthesismentioning
confidence: 99%
“…Details about PTCVD (SNS 1000n) can be found elsewhere. [21,28,46,47] Briefly, in PTCVD, 8 lamps (1 kW each) in the optical-head deliver optical energy through a quartz window directly on the catalyst at the top surface of a sample in the reaction chamber, while the sample itself is placed on a water-cooled chuck to keep its bulk temperature low. In this arrangement, the top surface of the sample reaches the temperature between 600 -750 o C depending on the electrical power supplied to the lamps, whereas the corresponding bulk temperature remains between 375 -450 o C. A plot showing the top surface temperature of a sample measured by a thermocouple corresponding to the bulk temperature measured by a pyrometer at the backside of a sample, is given in Figure S7 of the SI.…”
Section: Rie80mentioning
confidence: 99%