In this paper we present the progress on the development of the Continuous Optical Fast CVD (COFCVD) system based on the Silicon on Dust Substrate (SDS) process. The SDS process is a ribbon technology [1], where ribbons are grown on top of a silicon dust substrate, directly from a gas precursor, silane. Besides the advantages of avoiding kerf losses, the growth of silicon ribbons directly from a gaseous feedstock has the benefit of bypassing also unnecessary crystallization processes such as the Siemens process (see Figure 1).