Octoxy capped Si nanoparticles synthesized by homogeneous reduction of SiCl₄with crown ether alkalide

Abstract

Modified Pechini synthesis routes were developed for synthesis of the novel red phosphor materials NaLa(WO4)(MoO4):Eu 3+ and Ba2CaMoO6:Eu 3+ . Phase pure NaLa(WO4)(MoO4):Eu 3+ was obtained at calcination temperature ≥ 600 °C using malic acid or tartaric acid as complexing agents. Phase pure Ba2CaMoO6:Eu 3+ was attained using EDTA and citric acid, at calcination temperature ≥ 800 °C. Choice of complexing agents were discussed on the basis of precursor solubility, metal complex stability constants and conformations of the complexes. The powder properties were characterised using X-ray diffraction, thermal analysis and electron microscopy. Photoluminescence emission intensity was studied as a function of the complexing agents used and calcination temperature of the powders. Maximum emission intensity for NaLa(WO4)(MoO4):Eu 3+ was obtained at a calcination temperature of 600 °C.

Silicon Nanocrystals Synthesized from Silicon Tetrachloride Using Electron Beam Reduction Reaction#

“…This difference in the d-spacing values probably originates from the lattice distortions in finite sized NCs. 28,29 In our results, we assigned two main lattice planes, while the Xray diffraction pattern can show almost all the crystallographic information. It can be explained by the zone axis as well.…”

Organo‐Functionalization of Silicon Nanocrystals Synthesized by Inductively Coupled Plasma Chemical Vapor Deposition

“…The average size (Av) and standard deviation (SD) of the size distribution are 19.1 and 5.98 nm, respectively, indicating a broad size distribution. The lattice fringe with a d ‐spacing of 3.06 Å can be clearly seen, corresponding to the (111) plane of the diamond cubic‐structured Si, as shown in Figure (d) . The value of the d ‐spacing was calculated by averaging the distance of 10 grid intervals.…”

In Situ Synthesis of Hybrid Inorganic–Polymer Nanocomposites

“…The reaction is based on potassium cyclopentadiene acting as a nucleophile towards the silyl halide, forming Si clusters [96]. The following reaction of SiCl 4 on the surface with OH groups of surface capping agent produces HCl [97,98]. In the presence of HCl with excess -OH groups from surface termination groups, H 2 O is formed [42].…”