2013
DOI: 10.4028/www.scientific.net/amr.770.169
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Nitrogen – Doped SnO<sub>2</sub> Thin Films Prepared by Direct Current Magnetron Sputtering

Abstract: Nitrogen - doped tin oxide (N-doped SnO2) thin films were prepared on unheated glass substrate by dc magnetron sputtering of a Sn target in gas mixtures of O2 and N2. The N2 flow rates were varied from 0 to 15 SCCM with the same working pressure of 1×10-2 Torr. The as-deposited films were annealed in vacuum at 400 °C for 1 h. The films structure, electrical properties and optical properties were characterized by X-ray diffraction (XRD), 4-point probe and Hall effect measurement and portable fiber optic UV-vis … Show more

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Cited by 4 publications
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“…In this study, we report on the high µ FE SnON TFT with remarkably high µ FE of 299 cm 2 V −1 s −1 . The µ FE value is best among the reported data in literature, [5,19,20,[40][41][42][43][44][45] which is achieved in a 7-nm thick SnON channel of 7.6% nitrogen (N) content obtained with a nitrogen flow rate of 30 sccm as measured by X-ray photoelectron spectroscopy (XPS). The high µ FE is associated with reduced effective mass in SnON compared with SnO 2 .…”
Section: Introductionmentioning
confidence: 83%
“…In this study, we report on the high µ FE SnON TFT with remarkably high µ FE of 299 cm 2 V −1 s −1 . The µ FE value is best among the reported data in literature, [5,19,20,[40][41][42][43][44][45] which is achieved in a 7-nm thick SnON channel of 7.6% nitrogen (N) content obtained with a nitrogen flow rate of 30 sccm as measured by X-ray photoelectron spectroscopy (XPS). The high µ FE is associated with reduced effective mass in SnON compared with SnO 2 .…”
Section: Introductionmentioning
confidence: 83%