Nanoimprinting Techniques for Large-Area Three-Dimensional Negative Index Metamaterials with Operation in the Visible and Telecom Bands

Abstract

We report advances in materials, designs, and fabrication schemes for large-area negative index metamaterials (NIMs) in multilayer "fishnet" layouts that offer negative index behavior at wavelengths into the visible regime. A simple nanoimprinting scheme capable of implementation using standard, widely available tools followed by a subtractive, physical liftoff step provides an enabling route for the fabrication. Computational analysis of reflection and transmission measurements suggests that the resulting structures offer negative index of refraction that spans both the visible wavelength range (529-720 nm) and the telecommunication band (1.35-1.6 μm). The data reveal that these large (>75 cm(2)) imprinted NIMs have predictable behaviors, good spatial uniformity in properties, and figures of merit as high as 4.3 in the visible range.

Nanomanufacturing—Perspective and applications

“…Focused ion beam (FIB) is a nanofabrication method for complex threedimensional structures. In FIB, collisions cascade as an energetic [65,203]. particle interacts with the lattice matrix.…”

“…Fig. 1 (b) shows nanostructures fabricated on flexible negative index metamaterials for applications in the visible and telecom bands [65]. Another example is the James Webb Space Telescope, which contains a 6.5 m diameter hexagonal mirror comprising 18 mirror segments and requires roughness on the nanometric or subnanometric scale and a form accuracy of 20 nm to achieve the broad-spectrum detection ability in deep space [170].…”

Conformable Holographic Metasurfaces

“…Firstly, flexible MSs are compatible with roll-to-roll production and printed electronics 27 . Roll-to-roll production is of great interest for bringing MSs inexpensively, and in high volume, to market, given its relative technological maturity 28–30 .…”

Molecular aggregation states and wetting behavior of a poly{2-(perfluorooctyl)ethyl acrylate} brush-immobilized nano-imprinted surface

“…Numerous surface topography fabrication procedures have been reported, including nano-imprinting (NI) [10,11], self-assembly [12], and photolithography [13]. Among them, NI is a promising surface modification method due to its adaptability to large areas, as well as its high-resolution, and high-throughput processing [14,15].…”