Nanoclusters of MoO3−x embedded in an Al2O3 matrix engineered for customizable mesoscale resistivity and high dielectric strength

Tong, William M.; Brodie, Alan; Mane, Anil U.; Sun, Fuge; Kidwingira, Françoise; McCord, Mark A.; Bevis, Christopher F.; Elam, Jeffrey W.

doi:10.1063/1.4811480

Cited by 17 publications

(22 citation statements)

References 12 publications

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“…Note that the electrical transport mechanism in Mo:Al 2 O 3 composite layers was previously shown to be Frenkel-Pool emission (14). The transverse and longitudinal resistivity values are comparable for the (9:1) sample, and this finding is consistent with the homogenous and isotropic structure seen by TEM.…”

Section: Resultssupporting

confidence: 89%

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Atomic Layer Deposition of Nanostructured Tunable Resistance Coatings: Growth, Characterization, and Electrical Properties

et al. 2014

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We have developed atomic layer deposition (ALD) methods to synthesize robust nanostructured composite coatings with tunable resistance comprised of conducting, metallic nanoparticles embedded in an amorphous dielectric matrix. These films are nominally composed of M:Al 2 O 3 where M= W or Mo, and are prepared using alternating exposures to trimethyl aluminum (TMA) and H 2 O for Al 2 O 3 ALD and alternating MF 6 /Si 2 H 6 exposures for the metal ALD. By varying the ratio of ALD cycles for the metal and Al 2 O 3 components in the film, we can precisely adjust the resistivity of these composite coatings over a very broad range (e.g. 10 12 -10 3 Ohm-cm). Furthermore, the self-limiting nature of ALD allows us to grow these nanocomposite films on a variety of complex substrates such as high aspect ratio porous 3D surfaces, MEMS devices, ceramics, grid structures and microchannel plates. Here we present a detailed ALD study of the nanostructured composite resistance coatings including in-situ material growth, microstructural characterization, and electrical measurements.

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Section: Resultssupporting

confidence: 89%

“…In addition, we have applied these films as charge drain coatings in MEMS devices for a prototype electron beam lithography tool, and obtained high resolution electron beam patterns without charging artifacts (11,14). …”

Section: Resultsmentioning

confidence: 99%

Atomic Layer Deposition of Nanostructured Tunable Resistance Coatings: Growth, Characterization, and Electrical Properties

et al. 2014

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“…Figures 11a-f show images of electron beam test patterns obtained using this DPG. These images indicate virtually defect-free DPG patterns (19). …”

Section: B) Charge Drain Coatingsmentioning

confidence: 96%

(Invited) Synthesis, Characterization, and Application of Tunable Resistance Coatings Prepared by Atomic Layer Deposition

et al. 2013

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e REBL program, Office of the CTO, KLA-Tencor Corp., Milpitas, CA 95035, USAWe describe the synthesis, characterization, and application of nanocomposite, tunable resistance coatings consisting of conducting, metallic nanoparticles embedded in an amorphous dielectric matrix. These films are comprised of M:Al 2 O 3 with M=Mo or W, and are prepared by atomic layer deposition (ALD) using alternating exposures to trimethyl aluminum and H 2 O for the Al 2 O 3 ALD and alternating MF 6 /Si 2 H 6 exposures for the metal ALD. By varying the ratio of ALD cycles for the metal and the Al 2 O 3 components in the film, we can tune precisely the resistance of these coatings over a very broad range from 10 5 -10 12 Ohm.cm. These films exhibit ohmic behavior and resist breakdown even at high electric fields of 10 7 V/m. Moreover, the self-limiting nature of ALD allows us to grow these films inside of porous substrates and on complex 3D surfaces. As a result of these qualities, our nanocomposite films have proved exceptional as resistive coatings in microchannel plate electron multipliers and as charge drain coatings in electron-optical devices.

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“…The conductive and SEE layers as nano-engineered thin films were shown previously to be successfully and uniformly deposited by Sullivan et al onto non-lead glass MCPs [ 24 , 25 ] and plastic MCPs [ 26 ]. And the Argonne National Laboratory has systematically studied conductive layers on a broad range of oxides, such as ZnO:Al 2 O 3 , W:Al 2 O 3 , and MoO 3 − x :Al 2 O 3 [ 27 , 28 ], and characterized the SEE properties for MgO, Al 2 O 3 , and multilayered MgO/TiO 2 structures to serve as electron emissive layers in the channels of the MCPs [ 29 ]. However, the relationship of electrical performance of an MCP device as a function of nano-oxide thin film thickness has not been reported.…”

Section: Introductionmentioning

confidence: 99%

Nano-oxide thin films deposited via atomic layer deposition on microchannel plates

2015

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Microchannel plate (MCP) as a key part is a kind of electron multiplied device applied in many scientific fields. Oxide thin films such as zinc oxide doped with aluminum oxide (ZnO:Al2O3) as conductive layer and pure aluminum oxide (Al2O3) as secondary electron emission (SEE) layer were prepared in the pores of MCP via atomic layer deposition (ALD) which is a method that can precisely control thin film thickness on a substrate with a high aspect ratio structure. In this paper, nano-oxide thin films ZnO:Al2O3 and Al2O3 were prepared onto varied kinds of substrates by ALD technique, and the morphology, element distribution, structure, and surface chemical states of samples were systematically investigated by scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDS), X-ray diffraction (XRD), and X-ray photoemission spectroscopy (XPS), respectively. Finally, electrical properties of an MCP device as a function of nano-oxide thin film thickness were firstly studied, and the electrical measurement results showed that the average gain of MCP was greater than 2,000 at DC 800 V with nano-oxide thin film thickness approximately 122 nm. During electrical measurement, current jitter was observed, and possible reasons were preliminarily proposed to explain the observed experimental phenomenon.

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Nanoclusters of MoO3−x embedded in an Al2O3 matrix engineered for customizable mesoscale resistivity and high dielectric strength

Cited by 17 publications

References 12 publications

Atomic Layer Deposition of Nanostructured Tunable Resistance Coatings: Growth, Characterization, and Electrical Properties

Atomic Layer Deposition of Nanostructured Tunable Resistance Coatings: Growth, Characterization, and Electrical Properties

(Invited) Synthesis, Characterization, and Application of Tunable Resistance Coatings Prepared by Atomic Layer Deposition

Nano-oxide thin films deposited via atomic layer deposition on microchannel plates

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