Atomic Layer Deposition of Nanostructured Tunable Resistance Coatings: Growth, Characterization, and Electrical Properties

Mane, Anil U.; Tong, William M.; Brodie, Alan; McCord, Mark A.; Elam, Jeffrey W.

doi:10.1149/06409.0003ecst

Cited by 12 publications

(7 citation statements)

References 16 publications

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“…A similar microstructure was measured for ALD AlMo x F y films deposited under similar conditions. 21 In addition, previous X-ray photoelectron spectroscopy studies on thick ALD AlW x F y films confirmed the metallic nature of tungsten or tungsten carbide, and resistivity values from four-point measurement on the film were found to be 10 –2 Ω·cm, approximately 18 orders of magnitude smaller than that of Al 2 O 3 . 22 However, preliminary X-ray absorption spectroscopy data on AlW x F y -coated particles (not shown) suggest the presence of partially oxidized W δ+ species.…”

Section: Results and Discussionmentioning

confidence: 65%

Atomic Layer Deposition of Al–W–Fluoride on LiCoO₂ Cathodes: Comparison of Particle- and Electrode-Level Coatings

et al. 2017

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Atomic layer deposition (ALD) of the well-known Al 2 O 3 on a LiCoO 2 system is compared with that of a newly developed AlW x F y material. ALD coatings (∼1 nm thick) of both materials are shown to be effective in improving cycle life through mitigation of surface-induced capacity losses. However, the behaviors of Al 2 O 3 and AlW x F y are shown to be significantly different when coated directly on cathode particles versus deposition on a composite electrode composed of active materials, carbons, and binders. Electrochemical impedance spectroscopy, galvanostatic intermittent titration techniques, and four-point measurements suggest that electron transport is more limited in LiCoO 2 particles coated with Al 2 O 3 compared with that in particles coated with AlW x F y . The results show that proper design/choice of coating materials (e.g., AlW x F y ) can improve capacity retention without sacrificing electron transport and suggest new avenues for engineering electrode–electrolyte interfaces to enable high-voltage operation of lithium-ion batteries.

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Section: Results and Discussionmentioning

confidence: 65%

Atomic Layer Deposition of Al–W–Fluoride on LiCoO₂ Cathodes: Comparison of Particle- and Electrode-Level Coatings

et al. 2017

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“…Thin ALD W:Al 2 O 3 composite films were prepared in a custom hot-walled viscous flow ALD reactor described elsewhere and using previously published methods. , The precursors TMA (Aldrich, 99%), deionized H 2 O, Si 2 H 6 (Voltaix, 99.999%), and WF 6 (Aldrich, 99.9%) were used and maintained at room temperature. Films were deposited on quartz and p-type Si(100) substrates, and the deposition temperature was maintained at 200 °C.…”

Section: Experimental Sectionmentioning

confidence: 99%

W:Al₂O₃ Nanocomposite Thin Films with Tunable Optical Properties Prepared by Atomic Layer Deposition

et al. 2016

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A systematic alteration in the optical properties of W:Al2O3 nanocomposite films is demonstrated by precisely varying the W cycle percentage (W%) from 0 to 100% in Al2O3 during atomic layer deposition. The direct and indirect band energies of the nanocomposite materials decrease from 5.2 to 4.2 eV and from 3.3 to 1.8 eV, respectively, by increasing the W% from 10 to 40. X-ray absorption spectroscopy reveals that, for W% < 50, W is present in both metallic and suboxide states, whereas, for W% ≥ 50, only metallic W is seen. This transition from dielectric to metallic character at W% ∼ 50 is accompanied by an increase in the electrical and thermal conductivity and the disappearance of a clear band gap in the absorption spectrum. The density of the films increases monotonically from 3.1 g/cm3 for pure Al2O3 to 17.1 g/cm3 for pure W, whereas the surface roughness is greatest for the W% = 50 films. The W:Al2O3 nanocomposite films are thermally stable and show little change in optical properties upon annealing in air at 500 °C. These W:Al2O3 nanocomposite films show promise as selective solar absorption coatings for concentrated solar power applications.

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“…The material is deposited on the substrate in the form of a monoatomic film surface. ALD can produce a continuous film without pinholes, with excellent coverage, and can control the thickness and composition of the atomic film [ 1 , 2 , 4 , 11 , 13 , 19 , 20 ].…”

Section: Experimental and Methodsmentioning

confidence: 99%

The Design of the AZO Conductive Layer on Microchannel Plate

et al. 2021

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When the resistivity of the AZO conductive layer is within the MCP resistance requirement, the interval of the Zn content is very narrow (70–73%) and difficult to control. Aiming at the characteristics of the AZO conductive layer on the microchannel plate, an algorithm is designed to adjust the ratio of the conductive material ZnO and the high resistance material Al2O3. We put forward the concept of the working resistance of the MCP (i.e., the resistance during the electron avalanche in the microchannel). The working resistance of AZO-ALD-MCP (Al2O3/ZnO atomic layer deposition microchannel plate) was measured for the first time by the MCP resistance test system. In comparison with the conventional MCP, we found that the resistance of AZO-ALD-MCP in working state and non-working state is very different, and as the voltage increases, the working resistance significantly decreases. Therefore, we proposed a set of analytical methods for the conductive layer. We also proposed to adjust the ratio of the conductive material of the ALD-MCP conductive layer to the high-resistance material under the working resistance condition, and successfully prepared high-gain AZO-ALD-MCP. This design opens the way for finding better materials for the conductive layer of ALD-MCP to improve the performance of MCP.

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Atomic Layer Deposition of Nanostructured Tunable Resistance Coatings: Growth, Characterization, and Electrical Properties

Cited by 12 publications

References 16 publications

Atomic Layer Deposition of Al–W–Fluoride on LiCoO₂ Cathodes: Comparison of Particle- and Electrode-Level Coatings

Atomic Layer Deposition of Al–W–Fluoride on LiCoO₂ Cathodes: Comparison of Particle- and Electrode-Level Coatings

W:Al₂O₃ Nanocomposite Thin Films with Tunable Optical Properties Prepared by Atomic Layer Deposition

The Design of the AZO Conductive Layer on Microchannel Plate

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Atomic Layer Deposition of Nanostructured Tunable Resistance Coatings: Growth, Characterization, and Electrical Properties

Cited by 12 publications

References 16 publications

Atomic Layer Deposition of Al–W–Fluoride on LiCoO2 Cathodes: Comparison of Particle- and Electrode-Level Coatings

Atomic Layer Deposition of Al–W–Fluoride on LiCoO2 Cathodes: Comparison of Particle- and Electrode-Level Coatings

W:Al2O3 Nanocomposite Thin Films with Tunable Optical Properties Prepared by Atomic Layer Deposition

The Design of the AZO Conductive Layer on Microchannel Plate

Contact Info

Product

Resources

About

Atomic Layer Deposition of Al–W–Fluoride on LiCoO₂ Cathodes: Comparison of Particle- and Electrode-Level Coatings

Atomic Layer Deposition of Al–W–Fluoride on LiCoO₂ Cathodes: Comparison of Particle- and Electrode-Level Coatings

W:Al₂O₃ Nanocomposite Thin Films with Tunable Optical Properties Prepared by Atomic Layer Deposition